半导体学报
半導體學報
반도체학보
CHINESE JOURNAL OF SEMICONDUCTORS
2007年
6期
842-847
,共6页
全耗尽SOI-MOSFET%非均匀掺杂%表面势%阈值电压
全耗儘SOI-MOSFET%非均勻摻雜%錶麵勢%閾值電壓
전모진SOI-MOSFET%비균균참잡%표면세%역치전압
fully depleted SOI-MOSFET%non-uniform%surface potential%threshold voltage
对垂直于沟道的二维电势分布函数提出了一种新的近似,给出了基于这种近似的杂质浓度呈高斯分布的非均匀掺杂全耗尽SOI-MOSFET的阈值电压解析模型.模型结果与MEDICI数值模拟结果符合得很好,表明了模型的准确性,这为实践中分析与控制非均匀掺杂的全耗尽SOI-MOSFET的阈值电压提供了一种新的途径.
對垂直于溝道的二維電勢分佈函數提齣瞭一種新的近似,給齣瞭基于這種近似的雜質濃度呈高斯分佈的非均勻摻雜全耗儘SOI-MOSFET的閾值電壓解析模型.模型結果與MEDICI數值模擬結果符閤得很好,錶明瞭模型的準確性,這為實踐中分析與控製非均勻摻雜的全耗儘SOI-MOSFET的閾值電壓提供瞭一種新的途徑.
대수직우구도적이유전세분포함수제출료일충신적근사,급출료기우저충근사적잡질농도정고사분포적비균균참잡전모진SOI-MOSFET적역치전압해석모형.모형결과여MEDICI수치모의결과부합득흔호,표명료모형적준학성,저위실천중분석여공제비균균참잡적전모진SOI-MOSFET적역치전압제공료일충신적도경.
A novel approximation of the two-dimensional (2D) potential function perpendicular to the channel is proposed,and then an analytical threshold voltage model for a fully depleted SOI-MOSFET with a non-uniform Gaussian distribution doping profile is given based on this approximation.The model agrees well with numerical simulation by MEDICI.The result represents a new way and some reference points in analyzing and controlling the threshold voltage of non-uniform fully depleted (FD) SOI devices in practice.