湖南工业大学学报
湖南工業大學學報
호남공업대학학보
JOURNAL OF HUNAN UNIVERSITY OF TECHNOLOGY
2011年
5期
22-25,28
,共5页
ZAO薄膜%退火温度%电学性能%光学性能
ZAO薄膜%退火溫度%電學性能%光學性能
ZAO박막%퇴화온도%전학성능%광학성능
ZAO films%annealing temperature%electrical properties%optical properties
采用直流磁控溅射技术,在玻璃衬底上制备了ZnO：Al（ZAO）薄膜样品。其他参数不变,在不同的温度下对样品进行了退火处理,研究了薄膜的结构性质、电学和光学性质随退火温度的变化关系。实验结果表明：在退火温度为200℃时,ZAO薄膜具有较优的光电性能,其电阻率为9.62×10-5.cm,可见光区平均透射率为89.2%。
採用直流磁控濺射技術,在玻璃襯底上製備瞭ZnO：Al（ZAO）薄膜樣品。其他參數不變,在不同的溫度下對樣品進行瞭退火處理,研究瞭薄膜的結構性質、電學和光學性質隨退火溫度的變化關繫。實驗結果錶明：在退火溫度為200℃時,ZAO薄膜具有較優的光電性能,其電阻率為9.62×10-5.cm,可見光區平均透射率為89.2%。
채용직류자공천사기술,재파리츤저상제비료ZnO：Al（ZAO）박막양품。기타삼수불변,재불동적온도하대양품진행료퇴화처리,연구료박막적결구성질、전학화광학성질수퇴화온도적변화관계。실험결과표명：재퇴화온도위200℃시,ZAO박막구유교우적광전성능,기전조솔위9.62×10-5.cm,가견광구평균투사솔위89.2%。
The ZnO：Al（ZAO） films were deposited on glass substrates by using a DC reactive magnetron sputtering system.With the other parameters unchanged,the structural,electrical and optical properties of ZAO films were studied at the different annealing temperatures.The experimental results show that at the annealing temperature of 200 ℃ the ZAO thin film has better optical properties,the resistivity is 9.62×10-5 Ω·cm and the transmissivity in visible region is 89.2%.
