真空科学与技术学报
真空科學與技術學報
진공과학여기술학보
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY
2010年
1期
68-71
,共4页
周振%陈强%刘福平%任兆杏
週振%陳彊%劉福平%任兆杏
주진%진강%류복평%임조행
冷等离子体弧%超疏水表面%大气压%SiO_x薄膜
冷等離子體弧%超疏水錶麵%大氣壓%SiO_x薄膜
랭등리자체호%초소수표면%대기압%SiO_x박막
Cold plasma arc%Superhydrophobic%Atmospheric pressure%SiO_x
采用冷等离子弧在大气压下以六甲基二硅氧烷为单体制备SiO_x超疏水薄膜,研究不同工艺参数对薄膜的结构性能影响.通过傅里叶红外光谱(FTIR)对SiO_x薄膜进行了结构分析、通过原子力显微镜(AFM)和数字光学显微镜分析了SiO_x薄膜的表面形貌、通过接触角仪测试了所沉积的SiO_x薄膜亲/疏水性.在较为详细的研究冷等离子弧制备工艺参数对薄膜的影响后,如基片高度、单体输入量、沉积时间等,我们得到,在基片高度为10cm、单体输入量为90mL·min-1、沉积时间为2min时,可以制备出接触角为160°以上的SiO_x超疏水表面.
採用冷等離子弧在大氣壓下以六甲基二硅氧烷為單體製備SiO_x超疏水薄膜,研究不同工藝參數對薄膜的結構性能影響.通過傅裏葉紅外光譜(FTIR)對SiO_x薄膜進行瞭結構分析、通過原子力顯微鏡(AFM)和數字光學顯微鏡分析瞭SiO_x薄膜的錶麵形貌、通過接觸角儀測試瞭所沉積的SiO_x薄膜親/疏水性.在較為詳細的研究冷等離子弧製備工藝參數對薄膜的影響後,如基片高度、單體輸入量、沉積時間等,我們得到,在基片高度為10cm、單體輸入量為90mL·min-1、沉積時間為2min時,可以製備齣接觸角為160°以上的SiO_x超疏水錶麵.
채용랭등리자호재대기압하이륙갑기이규양완위단체제비SiO_x초소수박막,연구불동공예삼수대박막적결구성능영향.통과부리협홍외광보(FTIR)대SiO_x박막진행료결구분석、통과원자력현미경(AFM)화수자광학현미경분석료SiO_x박막적표면형모、통과접촉각의측시료소침적적SiO_x박막친/소수성.재교위상세적연구랭등리자호제비공예삼수대박막적영향후,여기편고도、단체수입량、침적시간등,아문득도,재기편고도위10cm、단체수입량위90mL·min-1、침적시간위2min시,가이제비출접촉각위160°이상적SiO_x초소수표면.
The SiO_x superhydrophobic coatings were grown by cold plasma arc deposition at atmospheric pressure with (CH_3)_3 SiOSi(CH_3)_3(HMDSO) as the monomer.The impacts of the film growth conditions,including the nozzle-substrate distance,flow rate of the monomer, and deposition time, on the microstructures and properties of the film were studied.The surface morphologies and hydrophobicity of the coating were characterized with Fourier transform infrared spectroscopy (FTIR),atomic force microscopy (AFM),optical microscopy and other conventional probes.The results show that the SiO_x superhydrophobic coatings,with a water contact angle higher than 160°,can be deposited under the optimized conditions:the nozzle-substrate distance of 10 cm,a monomer flow rate of 90mL·min~(-1) and a deposition time of 2min.