光子学报
光子學報
광자학보
ACTA PHOTONICA SINICA
2009年
10期
2613-2617
,共5页
谭天亚%于撼江%吴炜%郭永新%范正修%邵建达
譚天亞%于撼江%吳煒%郭永新%範正脩%邵建達
담천아%우감강%오위%곽영신%범정수%소건체
光学薄膜%二倍频增透膜%LBO晶体%激光损伤阈值%缓冲层
光學薄膜%二倍頻增透膜%LBO晶體%激光損傷閾值%緩遲層
광학박막%이배빈증투막%LBO정체%격광손상역치%완충층
Optical thin films%Frequency-doubled antireflection coating%LBO crystal%Laser-induced damage threshold%Buffer layer
采用电子束蒸发方法在LBO晶体上制备了无缓冲层和具有不同缓冲层的1 064 nm,532 nm二倍频增透膜.利用Lambda900分光光度计和调Q脉冲激光装置对样品的光学性能和抗激光损伤性能进行了测试分析.结果表明,所有样品在1 064 nm和532 nm波长的剩余反射率都分别小于0.1%和0.2%.与无缓冲层样品相比,采用SiO_2和MgF_2缓冲层薄膜的激光损伤阈值分别提高了23.1%和25.8%,而Al_2O_3缓冲层的插入却导致薄膜的激光损伤阈值降低.通过观察薄膜的激光损伤形貌,分析破斑的深度信息和电场分布,表明LBO晶体上1 064 nm,532 nm二倍频增透膜的激光损伤破坏主要表现为膜层剥落,激光产生的热冲击应力使薄膜应力发生很大变化,超过膜层之间的结合而引起膜层之间的分离.采用SiO_2或MgF_2缓冲层可改进Al_2O_3膜层的质量,从而有利于提高薄膜的激光损伤阈值.
採用電子束蒸髮方法在LBO晶體上製備瞭無緩遲層和具有不同緩遲層的1 064 nm,532 nm二倍頻增透膜.利用Lambda900分光光度計和調Q脈遲激光裝置對樣品的光學性能和抗激光損傷性能進行瞭測試分析.結果錶明,所有樣品在1 064 nm和532 nm波長的剩餘反射率都分彆小于0.1%和0.2%.與無緩遲層樣品相比,採用SiO_2和MgF_2緩遲層薄膜的激光損傷閾值分彆提高瞭23.1%和25.8%,而Al_2O_3緩遲層的插入卻導緻薄膜的激光損傷閾值降低.通過觀察薄膜的激光損傷形貌,分析破斑的深度信息和電場分佈,錶明LBO晶體上1 064 nm,532 nm二倍頻增透膜的激光損傷破壞主要錶現為膜層剝落,激光產生的熱遲擊應力使薄膜應力髮生很大變化,超過膜層之間的結閤而引起膜層之間的分離.採用SiO_2或MgF_2緩遲層可改進Al_2O_3膜層的質量,從而有利于提高薄膜的激光損傷閾值.
채용전자속증발방법재LBO정체상제비료무완충층화구유불동완충층적1 064 nm,532 nm이배빈증투막.이용Lambda900분광광도계화조Q맥충격광장치대양품적광학성능화항격광손상성능진행료측시분석.결과표명,소유양품재1 064 nm화532 nm파장적잉여반사솔도분별소우0.1%화0.2%.여무완충층양품상비,채용SiO_2화MgF_2완충층박막적격광손상역치분별제고료23.1%화25.8%,이Al_2O_3완충층적삽입각도치박막적격광손상역치강저.통과관찰박막적격광손상형모,분석파반적심도신식화전장분포,표명LBO정체상1 064 nm,532 nm이배빈증투막적격광손상파배주요표현위막층박락,격광산생적열충격응력사박막응력발생흔대변화,초과막층지간적결합이인기막층지간적분리.채용SiO_2혹MgF_2완충층가개진Al_2O_3막층적질량,종이유리우제고박막적격광손상역치.
1 064 nm,532 nm frequency-doubled antireflection coating with no buffer layer or with different buffer layers were fabricated by using electron beam evaporation technique on LBO. The optical property and laser-induced damage threshold (LIDT) were investigated by LambHa900 spectrometer and Q-switch pulse laser,respectively. The results shown that the reflectance of all samples is below 0.1% and 0. 2% at wavelength of 1 064 nm and 532 nm,respectively. Comparing with the sample of no buffer layer, LIDT of the coatings are improved by 23. 1% and 25. 8% using buffer layer of SiO_2 and MgF_2 and that of the coating with buffer layer of Al_2O_3 is decreased. By analyzing the morphology, depth information of laser-induced damage zones and electric field distribution of the film stacks,it is found that the laser - induced damage of 1 064 nm,532 nm frequency-doubled antireflection coating for LBO mainly exhibite spallation of a plated film under irradiation of a laser beam because the stress of the coating exceed its cohesion due to the thermal shock produced by laser. The quality of the Al_2O_3 layer of the film stacks is improved by using buffer layer of SiO_2 or MgF_2, therefore strengthen the performance of the laser-induced damage of the coating.