物理化学学报
物理化學學報
물이화학학보
ACTA PHYSICO-CHIMICA SINICA
2001年
2期
150-154
,共5页
曹刚敏%杨防祖%黄令%牛振江%许书楷%周绍民
曹剛敏%楊防祖%黃令%牛振江%許書楷%週紹民
조강민%양방조%황령%우진강%허서해%주소민
Ni-W-B合金%电沉积%结构%显微硬度%热处理
Ni-W-B閤金%電沉積%結構%顯微硬度%熱處理
Ni-W-B합금%전침적%결구%현미경도%열처리
采用电化学技术、XPS、DSC、XRD等方法研究Ni-W-B合金电沉积及热处理前后合金镀层的结构和显微硬度.结果表明,在Ni-W-B合金电沉积过程中伴随着化学沉积镍等过程以及Na2B4O7在镀层中的夹杂;Ni-W和Ni-W-B合金电沉积层分别表现为纳米晶结构和非晶态结构;热处理过程中合金电沉积层发生晶粒粗化过程以及Ni-W-B合金镀层发生新相形成过程,产生Ni4W和镍硼化物如Ni2B、Ni3B等沉淀物;400℃热处理2h后Ni-W合金镀层有最大的显微硬度达919.8kg·mm-2,而在500℃下Ni-W-B合金有最大的硬度达1132.2kg·mm-2.
採用電化學技術、XPS、DSC、XRD等方法研究Ni-W-B閤金電沉積及熱處理前後閤金鍍層的結構和顯微硬度.結果錶明,在Ni-W-B閤金電沉積過程中伴隨著化學沉積鎳等過程以及Na2B4O7在鍍層中的夾雜;Ni-W和Ni-W-B閤金電沉積層分彆錶現為納米晶結構和非晶態結構;熱處理過程中閤金電沉積層髮生晶粒粗化過程以及Ni-W-B閤金鍍層髮生新相形成過程,產生Ni4W和鎳硼化物如Ni2B、Ni3B等沉澱物;400℃熱處理2h後Ni-W閤金鍍層有最大的顯微硬度達919.8kg·mm-2,而在500℃下Ni-W-B閤金有最大的硬度達1132.2kg·mm-2.
채용전화학기술、XPS、DSC、XRD등방법연구Ni-W-B합금전침적급열처리전후합금도층적결구화현미경도.결과표명,재Ni-W-B합금전침적과정중반수착화학침적얼등과정이급Na2B4O7재도층중적협잡;Ni-W화Ni-W-B합금전침적층분별표현위납미정결구화비정태결구;열처리과정중합금전침적층발생정립조화과정이급Ni-W-B합금도층발생신상형성과정,산생Ni4W화얼붕화물여Ni2B、Ni3B등침정물;400℃열처리2h후Ni-W합금도층유최대적현미경도체919.8kg·mm-2,이재500℃하Ni-W-B합금유최대적경도체1132.2kg·mm-2.
The structure and microhardness of Ni-W-B alloy were studied by means of electrochemical techniques, XPS, DSC and XRD before and after heat treatment. The results showed that the process of Ni-W-B alloy electrodeposition was accompanied by the chemical deposition of Ni and adulteration of Na2B4O7 in the deposit. Ni-W alloy presented in nanocrystalline structure and Ni-W-B in amorphous structure were both coarsened in grain size and led to the evolution of Ni4W, and precipitation of Ni- B compound such as Ni2B, Ni3B in Ni-W-B alloy after heat treatment. The maximum microhardness could be observed for Ni-W alloy at the value of 919.8 kg· mm- 2 after heat treatment for 2 hours at temperature of 400 ℃ and Ni-W-B alloy at 1132.2 kg· mm- 2 (500 ℃ , 2 hrs).