冶金分析
冶金分析
야금분석
METALLURGICAL ANALYSIS
2010年
3期
30-33
,共4页
电感耦合等离子体原子发射光谱法%氧化钒%钾%钠%磷%硫%铁
電感耦閤等離子體原子髮射光譜法%氧化釩%鉀%鈉%燐%硫%鐵
전감우합등리자체원자발사광보법%양화범%갑%납%린%류%철
inductively coupled plasma atomic emission spectrometry%vanadium oxide%potassium%so-dium%phosphorus%sulfur%iron
样品经盐酸(1+1)和硝酸(1+1)分解后,采用电感耦合等离子体原子发射光谱法(ICP-AES)测定三氧化二钒和五氧化二钒中钾、钠、磷、硫、铁杂质元素的含量.采用基体匹配消除主量元素钒对杂质元素的干扰,优化了测定工作条件,确定钾、钠、磷、硫、铁的分析谱线分别为766.490 nm、589.592 nm、178.284 nm、182.034 nm、259.940 nm.测定氧化钾、氧化钠、磷、硫、铁的检出限分别为0.020 mg/L、0.012 mg/L、0.008 mg/L、0.010 mg/L、0.002 mg/L.方法用于标准样品和实际样品的分析,测定结果分别同认定值及其他方法的测定结果相吻合,相对标准偏差(n=11)为0.54%～4.0%.
樣品經鹽痠(1+1)和硝痠(1+1)分解後,採用電感耦閤等離子體原子髮射光譜法(ICP-AES)測定三氧化二釩和五氧化二釩中鉀、鈉、燐、硫、鐵雜質元素的含量.採用基體匹配消除主量元素釩對雜質元素的榦擾,優化瞭測定工作條件,確定鉀、鈉、燐、硫、鐵的分析譜線分彆為766.490 nm、589.592 nm、178.284 nm、182.034 nm、259.940 nm.測定氧化鉀、氧化鈉、燐、硫、鐵的檢齣限分彆為0.020 mg/L、0.012 mg/L、0.008 mg/L、0.010 mg/L、0.002 mg/L.方法用于標準樣品和實際樣品的分析,測定結果分彆同認定值及其他方法的測定結果相吻閤,相對標準偏差(n=11)為0.54%～4.0%.
양품경염산(1+1)화초산(1+1)분해후,채용전감우합등리자체원자발사광보법(ICP-AES)측정삼양화이범화오양화이범중갑、납、린、류、철잡질원소적함량.채용기체필배소제주량원소범대잡질원소적간우,우화료측정공작조건,학정갑、납、린、류、철적분석보선분별위766.490 nm、589.592 nm、178.284 nm、182.034 nm、259.940 nm.측정양화갑、양화납、린、류、철적검출한분별위0.020 mg/L、0.012 mg/L、0.008 mg/L、0.010 mg/L、0.002 mg/L.방법용우표준양품화실제양품적분석,측정결과분별동인정치급기타방법적측정결과상문합,상대표준편차(n=11)위0.54%～4.0%.
The samples were dissolved in hydrochloric acid(1+1) and nitric acid(1+1). The impure elements in vanadium trioxide and vanadium pentoxide including potassium, sodium, phosphorus, sul-fur and iron were determined by inductively coupled plasma atomic emission spectrometry (ICP-AES). The effects of vanadium could be eliminated by matrix matching. The working conditions were opti-mized. The analytical line were determined:K 766. 490 nm;Na,589. 592 nm;P,178. 284 nm;S,182. 034 nm;Fe, 259. 940 nm. The determination results of standard samples and actual samples were in good agreement with the certified values and those obtained by other methods. The relative standard devia-tion(n=11) was 0.54%-4.0%.
