表面技术
錶麵技術
표면기술
SURFACE TECHNOLOGY
2009年
6期
57-59
,共3页
电沉积%铬%掺杂钨丝%工艺参数%耐蚀性%CASS试验
電沉積%鉻%摻雜鎢絲%工藝參數%耐蝕性%CASS試驗
전침적%락%참잡오사%공예삼수%내식성%CASS시험
Electrodeposition%Chromium%Adulterate tungsten filament%Process parameter%Corrosion resistance%CASS test
为了研究掺杂钨丝(真空镀铬加热元件)表面电解沉积一定厚度(≥100μm)金属铬的工艺,详细考察了不同温度、电流密度、沉积时间等对镀层的影响,并对镀层进行了性能测试.结果表明,最佳工艺条件为:铬酐150～180g/L,硫酸1.5～1.8g/L,稀土(La~(3+))添加剂0.5～1.5g/L,温度为55℃,电流密度为8～10A/dm~2,电镀时间3h.此工艺条件下所得镀层光亮,色泽好,厚度可达100μm,且镀层耐蚀性好,结合力高.
為瞭研究摻雜鎢絲(真空鍍鉻加熱元件)錶麵電解沉積一定厚度(≥100μm)金屬鉻的工藝,詳細攷察瞭不同溫度、電流密度、沉積時間等對鍍層的影響,併對鍍層進行瞭性能測試.結果錶明,最佳工藝條件為:鉻酐150～180g/L,硫痠1.5～1.8g/L,稀土(La~(3+))添加劑0.5～1.5g/L,溫度為55℃,電流密度為8～10A/dm~2,電鍍時間3h.此工藝條件下所得鍍層光亮,色澤好,厚度可達100μm,且鍍層耐蝕性好,結閤力高.
위료연구참잡오사(진공도락가열원건)표면전해침적일정후도(≥100μm)금속락적공예,상세고찰료불동온도、전류밀도、침적시간등대도층적영향,병대도층진행료성능측시.결과표명,최가공예조건위:락항150～180g/L,류산1.5～1.8g/L,희토(La~(3+))첨가제0.5～1.5g/L,온도위55℃,전류밀도위8～10A/dm~2,전도시간3h.차공예조건하소득도층광량,색택호,후도가체100μm,차도층내식성호,결합력고.
A chromium coating with thickness of 100μm was electrodeposited on adulterate tungsten filament. The temperature, current density, deposition time, corrosion resistance, adhesion of the chromium coating was studied. The result shows that when CrO_3 concentration is 150～180g/L, H_2SO_4 is 1.5～1.8g/L, rare earth(La~(3+)) additives is 0.5～1.5g/L, temperature of the plating liquid is 55℃, current density is 8～10 A/dm~2, deposit time gets 3 hours, thickness of chromium coating can get 100μm, plating is brightness and fine colour and texture.And the chromium coating has good adhesion and corrosion resistance.
