中国有色金属学报（英文版）
中國有色金屬學報（英文版）
중국유색금속학보（영문판）
TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA
2011年
z1期
73-77
,共5页
CrN%thin films%deposition%microstructure%arc ion plating%ion bombardment
Applying negative bias voltages caused significant microstructure changes in arc ion plated CrN films. Nanocrystalline microstructures were obtained by adjusting the negative bias voltage. Structural characterizations of the films were carried out using X-ray diffractometry (XRD) and high-resolution transmission electron microscopy (HR-TEM). The results indicated that increasing ion bombardment by applying negative bias voltages resulted in the formation of defects in the CrN films, inducing microstructure evolution from micro-columnar to nanocrystalline. The microhardness and residual stresses of the films were also affected. Based on the experimental results, the evolution mechanisms of the film microstructure and properties were discussed by considering ion bombardment eftects.
