等离子体科学和技术(英文版)
等離子體科學和技術(英文版)
등리자체과학화기술(영문판)
PLASMA SCIENCE & TECHNOLOGY
2003年
6期
2063-2070
,共8页
nitrogenated amorphous carbon film%incorporation of nitrogen%optical emission spectroscopy%surface wave plasma%Raman
In order to study the influence of nitrogen incorporated into amorphous carbon films,nitrogenated amorphous carbon films have been deposited by using surface wave plasma chemical vapor deposition under various ratios of N2/CH4 gas flow. Optical emission spectroscopy has been used to monitor plasma features near the deposition zone. After deposition, the samples are checked by Raman spectroscopy and x-ray photo spectroscopy (XPS). Optical emission intensities of CH and N atom in the plasma are found to be enhanced with the increase in the N2/CH4 gas flow ratio, and then reach their maximums when the N2/CH4 gas flow ratio is 5%. A contrary variation is found in Raman spectra of deposited films. The intensity ratio of the D band to the G band (ID/IG) and the peak positions of the G and D bands all reach their minimums when the N2/CH4 gas flow ratio is 5%. These show that the structure of amorphous carbon films has been significantly modified by introduction of nitrogen.
