功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2009年
11期
1836-1839
,共4页
陈伟绩%秦福文%吴爱民%王文彦
陳偉績%秦福文%吳愛民%王文彥
진위적%진복문%오애민%왕문언
GaN%氮化%ECR-PEMOCVD%玻璃衬底
GaN%氮化%ECR-PEMOCVD%玻璃襯底
GaN%담화%ECR-PEMOCVD%파리츤저
GaN%nitridation%ECR-PEMOCVD%glass substrate
采用电子回旋共振-等离子体增强金属有机物化学气相沉积(ECR-PEMOCVD)方法,在康宁7101型普通玻璃衬底上低温沉积氮化镓(GaN)薄膜.利用反射高能电子衍射(RHEED)、X射线衍射(XRD)、原子力显微镜(AFM)和霍尔测量系统检测样品,研究了衬底氮化时间对GaN薄膜质量的影响.结果表明,氮化时间为5min时,得到的GaN薄膜呈高度c轴择优取向,结晶性较好,薄膜表面是由许多亚微米量级的表面岛按一致的取向规则堆砌而成的,薄膜表面较为平整且呈n型导电;氮化时间增加,薄膜结晶性反而变差.
採用電子迴鏇共振-等離子體增彊金屬有機物化學氣相沉積(ECR-PEMOCVD)方法,在康寧7101型普通玻璃襯底上低溫沉積氮化鎵(GaN)薄膜.利用反射高能電子衍射(RHEED)、X射線衍射(XRD)、原子力顯微鏡(AFM)和霍爾測量繫統檢測樣品,研究瞭襯底氮化時間對GaN薄膜質量的影響.結果錶明,氮化時間為5min時,得到的GaN薄膜呈高度c軸擇優取嚮,結晶性較好,薄膜錶麵是由許多亞微米量級的錶麵島按一緻的取嚮規則堆砌而成的,薄膜錶麵較為平整且呈n型導電;氮化時間增加,薄膜結晶性反而變差.
채용전자회선공진-등리자체증강금속유궤물화학기상침적(ECR-PEMOCVD)방법,재강저7101형보통파리츤저상저온침적담화가(GaN)박막.이용반사고능전자연사(RHEED)、X사선연사(XRD)、원자력현미경(AFM)화곽이측량계통검측양품,연구료츤저담화시간대GaN박막질량적영향.결과표명,담화시간위5min시,득도적GaN박막정고도c축택우취향,결정성교호,박막표면시유허다아미미량급적표면도안일치적취향규칙퇴체이성적,박막표면교위평정차정n형도전;담화시간증가,박막결정성반이변차.
GaN films have been deposited on corning 7101 glass substrate by electron cyclotron resonance plasma enhanced metal organic chemical vapor deposition (ECR-PEMOCVD) system at low temperature. The effect of substrate nitriding time on the quality of GaN flim is studied using reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD), atomic force microscope (AFM) and Hall measurements. The results show that GaN film deposited with substrate nitrided for 5min is of high c-axis preferred orientation and highly crystallined, its surface is composed of many submicron grains piled in the consistent orientation and the film shows the n-type electrical behavior. The crystallization of GaN film degrades as the substrate nitriding time increased.