中国有色金属学报
中國有色金屬學報
중국유색금속학보
THE CHINESE JOURNAL OF NONFERROUS METALS
2009年
7期
1294-1299
,共6页
马旭莉%郝晓刚%李永国%刘世斌%孙彦平
馬旭莉%郝曉剛%李永國%劉世斌%孫彥平
마욱리%학효강%리영국%류세빈%손언평
脉冲电沉积%NiHCF膜%电化学控制离子分离%循环伏安
脈遲電沉積%NiHCF膜%電化學控製離子分離%循環伏安
맥충전침적%NiHCF막%전화학공제리자분리%순배복안
pulsed electrodeposition%NiHCF thin film%electrochemically controlled ion separation%cyclic voltammetry
采用脉冲电沉积法在石墨基体上制备了铁氰化镍膜(NiHCF膜).通过循环伏安法考察了不同脉冲参数(脉冲电压、脉冲周期、占空比、沉积次数)条件下制备的石墨基NiHCF膜电极的离子交换容量,并通过SEM和XPS分析了膜的表面形貌与组成.结果表明:脉冲电压0.3 V(vs SCE)、脉冲周期0.6 s、占空比为50%时沉积得到的NiHCF膜均匀致密,且具有较大的离子交换容量和良好的稳定性.脉冲电沉积法可用于制备性能优良的电化学控制离子分离膜电极.
採用脈遲電沉積法在石墨基體上製備瞭鐵氰化鎳膜(NiHCF膜).通過循環伏安法攷察瞭不同脈遲參數(脈遲電壓、脈遲週期、佔空比、沉積次數)條件下製備的石墨基NiHCF膜電極的離子交換容量,併通過SEM和XPS分析瞭膜的錶麵形貌與組成.結果錶明:脈遲電壓0.3 V(vs SCE)、脈遲週期0.6 s、佔空比為50%時沉積得到的NiHCF膜均勻緻密,且具有較大的離子交換容量和良好的穩定性.脈遲電沉積法可用于製備性能優良的電化學控製離子分離膜電極.
채용맥충전침적법재석묵기체상제비료철청화얼막(NiHCF막).통과순배복안법고찰료불동맥충삼수(맥충전압、맥충주기、점공비、침적차수)조건하제비적석묵기NiHCF막전겁적리자교환용량,병통과SEM화XPS분석료막적표면형모여조성.결과표명:맥충전압0.3 V(vs SCE)、맥충주기0.6 s、점공비위50%시침적득도적NiHCF막균균치밀,차구유교대적리자교환용량화량호적은정성.맥충전침적법가용우제비성능우량적전화학공제리자분리막전겁.
The electroactive nickel hexacyanoferrate (NiHCF) thin films were generated on graphite substrates by pulsed electrodeposition. The composition and morphology of the NiHCF thin film were investigated using XPS and SEM. In 1 mol/L KNO3 solution, the potential cycling in the range of 200-1 000 mV (vs SCE) is used to reversibly intercalate and deintercalate K+ from the matrix. The effects of the pulsed deposition parameters, such as pulse potential, duty cycle and deposition time (ton/toff) on the ion-exchange capacity of NiHCF film electrodes were investigated. The cycle life of the film electrodes was also investigated. The results show that the NiHCF thin films formed on graphite substrates are suitable for electrochemically controlled ion separation (ECIS) processes. The films display high ion exchange capacity for K+ and good stability, and the optimum pulse potential, pulse period and duty cycle are 0.3 V (vs SCE), 0.6s and 50%, respectively.