中山大学学报(自然科学版)
中山大學學報(自然科學版)
중산대학학보(자연과학판)
ACTA SCIENTIARUM NATURALIUM UNIVERSITATIS SUNYATSENI
2007年
z1期
15-16
,共2页
王改田%涂江平%王淑芬%王秀丽
王改田%塗江平%王淑芬%王秀麗
왕개전%도강평%왕숙분%왕수려
钛酸锶%储氢合金%光充电%退火温度
鈦痠鍶%儲氫閤金%光充電%退火溫度
태산송%저경합금%광충전%퇴화온도
Strontium titanate%hydrogen storage alloy%photoelectrochemical performance%annealing temperature
研究了Nb掺杂SrTiO3薄膜的光电化学性能及其对储氢合金薄膜的光充电性能.采用射频磁控溅射将SrTiO3薄膜沉积在镍片基体上,在300～600℃退火处理后,采用直流磁控溅射将LaNi3.9Al1.3储氢合金薄膜沉积在镍片基体的背面构成SrTiO3/Ni/储氢合金电极.随着Nb掺杂SrTiO3薄膜热处理温度的升高,阳极光电流和光充电性能先增大后减小.
研究瞭Nb摻雜SrTiO3薄膜的光電化學性能及其對儲氫閤金薄膜的光充電性能.採用射頻磁控濺射將SrTiO3薄膜沉積在鎳片基體上,在300～600℃退火處理後,採用直流磁控濺射將LaNi3.9Al1.3儲氫閤金薄膜沉積在鎳片基體的揹麵構成SrTiO3/Ni/儲氫閤金電極.隨著Nb摻雜SrTiO3薄膜熱處理溫度的升高,暘極光電流和光充電性能先增大後減小.
연구료Nb참잡SrTiO3박막적광전화학성능급기대저경합금박막적광충전성능.채용사빈자공천사장SrTiO3박막침적재얼편기체상,재300～600℃퇴화처리후,채용직류자공천사장LaNi3.9Al1.3저경합금박막침적재얼편기체적배면구성SrTiO3/Ni/저경합금전겁.수착Nb참잡SrTiO3박막열처리온도적승고,양겁광전류화광충전성능선증대후감소.
The photoelectrochemical performances of Nb-doped SrTiO3 films and their photochargeability to hydrogen storage alloy films were investigated. The Nb-doped SrTiO3 films were deposited on nickel substrate by rf magnetron sputtering. After annealed at 300～600℃, the LaNi3.9Al1.3 hydrogen storage alloy films were deposited on the back of the Ni substrate by DC magnetron sputtering to form the Nb-doped SrTiO3/Ni/hydrogen storage alloy (SHN) electrodes. With increasing the annealing temperature of the SrTiO3 film, the anodic photocurrent and photochargeability first increased, then decreased.
