物理化学学报
物理化學學報
물이화학학보
ACTA PHYSICO-CHIMICA SINICA
2007年
11期
1743-1746
,共4页
陈扬%景粉宁%叶为春%王春明
陳颺%景粉寧%葉為春%王春明
진양%경분저%협위춘%왕춘명
自催化化学沉积%阳极溶出%Pd%原子力显微镜%p型单晶硅(100)
自催化化學沉積%暘極溶齣%Pd%原子力顯微鏡%p型單晶硅(100)
자최화화학침적%양겁용출%Pd%원자력현미경%p형단정규(100)
Autocatalytic electroless deposition%Anodic stripping%Palladium%Atomic force microscopy%p-Silicon (100)
研究了Pd在氢终止的p型单晶硅(100)表面的自催化化学沉积(AED).在室温下将刻蚀过的硅片浸入常规的HF-PdCl2-HCl溶液制备了Pd膜.将沉积了Pd的基底作为工作电极,用循环伏安法(CV)、原子力显微镜(AFM)和X射线光电子能谱(XPS)研究了Pd膜的阳极溶出行为和形貌.结果表明,Pd的生长遵循Volmer-Weer(VW)生长模式,Pd膜给出了很好的支持.
研究瞭Pd在氫終止的p型單晶硅(100)錶麵的自催化化學沉積(AED).在室溫下將刻蝕過的硅片浸入常規的HF-PdCl2-HCl溶液製備瞭Pd膜.將沉積瞭Pd的基底作為工作電極,用循環伏安法(CV)、原子力顯微鏡(AFM)和X射線光電子能譜(XPS)研究瞭Pd膜的暘極溶齣行為和形貌.結果錶明,Pd的生長遵循Volmer-Weer(VW)生長模式,Pd膜給齣瞭很好的支持.
연구료Pd재경종지적p형단정규(100)표면적자최화화학침적(AED).재실온하장각식과적규편침입상규적HF-PdCl2-HCl용액제비료Pd막.장침적료Pd적기저작위공작전겁,용순배복안법(CV)、원자력현미경(AFM)화X사선광전자능보(XPS)연구료Pd막적양겁용출행위화형모.결과표명,Pd적생장준순Volmer-Weer(VW)생장모식,Pd막급출료흔호적지지.
The autocatalytic electroless deposition (AED) of palladium onto p-silicon (100) with hydrogen termination was studied. Pd films were prepared by immersing the hydrogen-terminated silicon wafers into conventional HF-PdCl2-HCl solution at room temperature. The anodic stripping behaviors and morphologies of the Pd deposits were studied using cyclic voltammetry (CV), atomic force microscopy (AFM), and X-ray photoelectron spectroscopy (XPS). The results showed that the Pd growth was in Volmer-Weber (VW) mode and the Pd film had good adhesion.
