中国航空学报(英文版)
中國航空學報(英文版)
중국항공학보(영문판)
CHINESE JOURNAL OF AERONAUTICS
2003年
4期
253-256
,共4页
马晓艳%毕晓昉%宫声凯%徐惠彬
馬曉豔%畢曉昉%宮聲凱%徐惠彬
마효염%필효방%궁성개%서혜빈
双层膜%三层膜%层间耦合%非磁性中间层%磁畴观察
雙層膜%三層膜%層間耦閤%非磁性中間層%磁疇觀察
쌍층막%삼층막%층간우합%비자성중간층%자주관찰
bilayer%trilayer%interlayer coupling%nonmagnetic spacer%domain observation
巨磁电阻自旋阀多层膜作为磁敏传感器材料与磁随机存储器(MRAM)材料,具有高的可靠性与灵敏度,在航空航天等高科技领域有着极大的应用前景.研究多层膜各层间的耦合效应与各层厚度、磁学性能之间的内在关系,对提高自旋阀的巨磁电阻效应、磁灵敏性等具有重要的作用.本研究采用磁控溅射沉积制备了(Cu/Co、Cu/NiFe, Ta/NiFe双层膜与 Co/Cu/Co、Co/Cu/NiFe、Co/Ta/NiFe)三明治结构薄膜.采用振动样品磁强计对薄膜磁性、四探针法对薄膜磁阻性能进行了测试研究,采用洛仑兹电子显微镜法观察了薄膜的磁畴结构.研究结果表明,层间耦合效应不仅与非磁性中间层的厚度相关,而且与中间层材料的特性相关.磁阻与磁畴观察均表明层间耦合效应随中间层厚度的增加而减小,而Cu作为中间层的多层膜的层间耦合大于Ta作为中间层的层间耦合.
巨磁電阻自鏇閥多層膜作為磁敏傳感器材料與磁隨機存儲器(MRAM)材料,具有高的可靠性與靈敏度,在航空航天等高科技領域有著極大的應用前景.研究多層膜各層間的耦閤效應與各層厚度、磁學性能之間的內在關繫,對提高自鏇閥的巨磁電阻效應、磁靈敏性等具有重要的作用.本研究採用磁控濺射沉積製備瞭(Cu/Co、Cu/NiFe, Ta/NiFe雙層膜與 Co/Cu/Co、Co/Cu/NiFe、Co/Ta/NiFe)三明治結構薄膜.採用振動樣品磁彊計對薄膜磁性、四探針法對薄膜磁阻性能進行瞭測試研究,採用洛崙玆電子顯微鏡法觀察瞭薄膜的磁疇結構.研究結果錶明,層間耦閤效應不僅與非磁性中間層的厚度相關,而且與中間層材料的特性相關.磁阻與磁疇觀察均錶明層間耦閤效應隨中間層厚度的增加而減小,而Cu作為中間層的多層膜的層間耦閤大于Ta作為中間層的層間耦閤.
거자전조자선벌다층막작위자민전감기재료여자수궤존저기(MRAM)재료,구유고적가고성여령민도,재항공항천등고과기영역유착겁대적응용전경.연구다층막각층간적우합효응여각층후도、자학성능지간적내재관계,대제고자선벌적거자전조효응、자령민성등구유중요적작용.본연구채용자공천사침적제비료(Cu/Co、Cu/NiFe, Ta/NiFe쌍층막여 Co/Cu/Co、Co/Cu/NiFe、Co/Ta/NiFe)삼명치결구박막.채용진동양품자강계대박막자성、사탐침법대박막자조성능진행료측시연구,채용락륜자전자현미경법관찰료박막적자주결구.연구결과표명,층간우합효응불부여비자성중간층적후도상관,이차여중간층재료적특성상관.자조여자주관찰균표명층간우합효응수중간층후도적증가이감소,이Cu작위중간층적다층막적층간우합대우Ta작위중간층적층간우합.
Cu/Co, Cu/NiFe, Ta/NiFe bilayers and Co/Cu/Co, Co/Cu/NiFe, Co/Ta/NiFe sandwich films were deposited by a magnetron sputtering method. Magnetic properties were evaluated by VSM and spin valve magnetoresistance was investigated by a four-probe method to study the interlayer coupling of the two magnetic layers. It has been found that the interlayer coupling depended not only on the layer thickness of the nonmagnetic spacer but also on the nature of the spacer. The interlayer coupling was reduced as the spacer layer thickness increased. The result was consistent with those from observations of the magnetic domain for the trilayers by means of Lorentz Electron Microscope. The trilayers with Cu spacer layer have shown a stronger coupling than those with Ta spacer layer.