功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2010年
3期
450-452,456
,共4页
射频反应磁控溅射%氮化锆薄膜%离子导体
射頻反應磁控濺射%氮化鋯薄膜%離子導體
사빈반응자공천사%담화고박막%리자도체
reactive magnetron sputtering%zirconium nitride films%ion conductor
采用射频反应磁控溅射工艺,以纯Zr为靶材,在WO3/ITO/Glass基片上采用不同工艺参数沉积ZrN_x薄膜,用紫外-可见分光光度计、循环伏安法、X射线衍射仪、扫描电镜等研究了ZrN_x薄膜的离子导电性能.研究结果表明,所制备的ZrN_x薄膜为非晶态,ZrN_x/WO_3/ITO/Glass复合膜的光学调节范围最大达57%以上,在离子传导过程中表现出良好的离子导电性能.
採用射頻反應磁控濺射工藝,以純Zr為靶材,在WO3/ITO/Glass基片上採用不同工藝參數沉積ZrN_x薄膜,用紫外-可見分光光度計、循環伏安法、X射線衍射儀、掃描電鏡等研究瞭ZrN_x薄膜的離子導電性能.研究結果錶明,所製備的ZrN_x薄膜為非晶態,ZrN_x/WO_3/ITO/Glass複閤膜的光學調節範圍最大達57%以上,在離子傳導過程中錶現齣良好的離子導電性能.
채용사빈반응자공천사공예,이순Zr위파재,재WO3/ITO/Glass기편상채용불동공예삼수침적ZrN_x박막,용자외-가견분광광도계、순배복안법、X사선연사의、소묘전경등연구료ZrN_x박막적리자도전성능.연구결과표명,소제비적ZrN_x박막위비정태,ZrN_x/WO_3/ITO/Glass복합막적광학조절범위최대체57%이상,재리자전도과정중표현출량호적리자도전성능.
Using pure zirconium and chromium as targets,ZrN_x films were deposited on WO_3/ITO/Glass substrates by reactive magnetron sputtering.The films were analyzed by UV-Vis spectrophotometer,cyclic voltammetry (CV),X-ray diffractometer (XRD),FEG-SEM and so on.The ion conductor properties of the ZrN_x films were studied. The research results show that the ZrN_x films deposited by reactive magnetron sputtering are amorphous.The maximum optical modulation range of ZrN_x/WO_3/ITO/Glass device is more than 57%.The ZrN_x films exhibit good ionic conductivity in the ion conductive process.
