CAJ | 학술논문

介绍了用X射线反射测量术表征双层薄膜中低原子序数材料特性的方法.由于低原子序数材料的光学常数与Si基板材料的光学常数非常接近,用X射线反射法确定镀制在Si基板上的低原子序数材料膜层结构的变化十分困难,因此,提出了在镀制低原子序数材料前,首先在基板上镀制一层非常薄的金属层的方法.实验中,选用cr作为金属层材料,制备并测试了三种不同C膜镀制时间的Cr/C双层薄膜.反射率曲线拟合结果表明,C膜密度约为2.25 g/cm3,沉积速率为0.058 nm/s.
개소료용X사선반사측량술표정쌍층박막중저원자서수재료특성적방법.유우저원자서수재료적광학상수여Si기판재료적광학상수비상접근,용X사선반사법학정도제재Si기판상적저원자서수재료막층결구적변화십분곤난,인차,제출료재도제저원자서수재료전,수선재기판상도제일층비상박적금속층적방법.실험중,선용cr작위금속층재료,제비병측시료삼충불동C막도제시간적Cr/C쌍층박막.반사솔곡선의합결과표명,C막밀도약위2.25 g/cm3,침적속솔위0.058 nm/s.
A convenient method,low-angle X-ray reflectivity measurement method,is presented to characterize the parameters of low-Z material layers in bilayer structures using X-ray diffractometer (XRD).Because the low-Z material optical constant is similar to the silicon(Si)substrate,the change of the low-Z material layer profiles is difficult to determine.Therefore,an ultra-thin metal layer is deposited as the Base Layer(BL)onto the substrate prior to the low-Z material layer.By choosing chromium(Cr)as the BL material,three Cr/C bilayer films with different C deposition times are fabricated and measured.After the simulation of the reflectivity curves,the density of C is approximately 2.25 g/cm3,while the deposition rate of C layer is 0.058 nm/s under our laboratory conditions.