无机材料学报
無機材料學報
무궤재료학보
JOURNAL OF INORGANIC MATERIALS
2000年
2期
304-308
,共5页
磁控反应溅射%NiCrOx薄膜%光学常数%光谱选择性吸收表面
磁控反應濺射%NiCrOx薄膜%光學常數%光譜選擇性吸收錶麵
자공반응천사%NiCrOx박막%광학상수%광보선택성흡수표면
magnetron reactive sputtering%NiCrOx thin films%optical constants%solar selective surface
研究了反应气体流量对磁控反应溅射NiCrOx薄膜成分和光学常数的影响. 在反应溅射过程中，NiCr靶随着O2流量的增大出现毒化现象. 在不同氧流量条件下可沉积出近于透明的介电薄膜和不透明的吸收薄膜. 对薄膜光学常数的研究可应用到太阳能光谱选择性吸收薄膜的制备.
研究瞭反應氣體流量對磁控反應濺射NiCrOx薄膜成分和光學常數的影響. 在反應濺射過程中，NiCr靶隨著O2流量的增大齣現毒化現象. 在不同氧流量條件下可沉積齣近于透明的介電薄膜和不透明的吸收薄膜. 對薄膜光學常數的研究可應用到太暘能光譜選擇性吸收薄膜的製備.
연구료반응기체류량대자공반응천사NiCrOx박막성분화광학상수적영향. 재반응천사과정중，NiCr파수착O2류량적증대출현독화현상. 재불동양류량조건하가침적출근우투명적개전박막화불투명적흡수박막. 대박막광학상수적연구가응용도태양능광보선택성흡수박막적제비.
The influence of mass flow of reactive gas on the composition and optical constants of deposited NiCrOx thin films was investigated. The results obtained show that NiCr target exhibits a poisoning phenomenon as O2 flow rate increased to a certain value during the reactive sputtering process. It is possible to deposit near transparent, dielectric thin films as well as the non-transparent, absorbing thin films. The study of optical constants of the thin films deposited at different
