辐射研究与辐射工艺学报
輻射研究與輻射工藝學報
복사연구여복사공예학보
JOURNAL OF RADIATION RESEARCH AND RADIATION PROCESSING
2003年
2期
139-142
,共4页
浓缩铀%淋巴细胞%非程序DNA合成%刺激作用
濃縮鈾%淋巴細胞%非程序DNA閤成%刺激作用
농축유%림파세포%비정서DNA합성%자격작용
235UO2F2%Lymphocytes%Unscheduled DNA synthesis%Stimulatory effect
研究了不同水平浓缩铀(235UO2F2)对淋巴细胞DNA损伤修复的作用及其机理.应用紫外线诱导的非程序DNA合成 (UDS) 检测,观察浓缩铀(235UO2F2)内污染对小鼠脾淋巴细胞DNA损伤修复的影响.结果表明, 浓缩铀摄入量为0.1-20μg/kg 体重时, 脾淋巴细胞紫外线诱导的UDS显著高于对照组 (p<0.05或p<0.01); 浓缩铀内污染12d时, 脾淋巴细胞未经紫外线照射的UDS显著增加 (p<0.05或p<0.01); PHA组脾淋巴细胞紫外线诱导的UDS显著低于未加PHA组.在一定剂量范围内,低剂量浓缩铀内污染对淋巴细胞DNA损伤修复功能具有明显的刺激作用,并且该剂量范围明显大于外照射;浓缩铀内污染对淋巴细胞DNA具有持续的损伤作用,继而诱发细胞DNA修复功能的增强;PHA刺激但未增殖的脾淋巴细胞DNA损伤修复功能明显减低.
研究瞭不同水平濃縮鈾(235UO2F2)對淋巴細胞DNA損傷脩複的作用及其機理.應用紫外線誘導的非程序DNA閤成 (UDS) 檢測,觀察濃縮鈾(235UO2F2)內汙染對小鼠脾淋巴細胞DNA損傷脩複的影響.結果錶明, 濃縮鈾攝入量為0.1-20μg/kg 體重時, 脾淋巴細胞紫外線誘導的UDS顯著高于對照組 (p<0.05或p<0.01); 濃縮鈾內汙染12d時, 脾淋巴細胞未經紫外線照射的UDS顯著增加 (p<0.05或p<0.01); PHA組脾淋巴細胞紫外線誘導的UDS顯著低于未加PHA組.在一定劑量範圍內,低劑量濃縮鈾內汙染對淋巴細胞DNA損傷脩複功能具有明顯的刺激作用,併且該劑量範圍明顯大于外照射;濃縮鈾內汙染對淋巴細胞DNA具有持續的損傷作用,繼而誘髮細胞DNA脩複功能的增彊;PHA刺激但未增殖的脾淋巴細胞DNA損傷脩複功能明顯減低.
연구료불동수평농축유(235UO2F2)대림파세포DNA손상수복적작용급기궤리.응용자외선유도적비정서DNA합성 (UDS) 검측,관찰농축유(235UO2F2)내오염대소서비림파세포DNA손상수복적영향.결과표명, 농축유섭입량위0.1-20μg/kg 체중시, 비림파세포자외선유도적UDS현저고우대조조 (p<0.05혹p<0.01); 농축유내오염12d시, 비림파세포미경자외선조사적UDS현저증가 (p<0.05혹p<0.01); PHA조비림파세포자외선유도적UDS현저저우미가PHA조.재일정제량범위내,저제량농축유내오염대림파세포DNA손상수복공능구유명현적자격작용,병차해제량범위명현대우외조사;농축유내오염대림파세포DNA구유지속적손상작용,계이유발세포DNA수복공능적증강;PHA자격단미증식적비림파세포DNA손상수복공능명현감저.
The paper is to elucidate the effects of in vivo exposure to different levels of 235UO2F2 on DNA repair capability and the mechanism. The DNA repair capacity, as measured by UV-induced unscheduled DNA synthesis (UDS) of splenic lymphocytes from inbred BALB/c male mice, was observed after injection of different doses of 235UO2F2 into the caudal vein. UV-induced UDS of the splenic lymphocytes increased significantly (p<0.05 or p< 0.01) at doses of 0.1-20μg / kg body weight. Non-UV-induced UDS showed a significant increase (p<0.05 or p< 0.01) 12 days after 235UO2F2 injection. The UV-induced UDS in PHA activated but non-proliferating (hydroxyurea treated) lymphocytes were lower than those of lymphocytes unexposed to PHA at the same doses of 235UO2F2 (p<0.05 or p<0.01). Low doses of internally deposited 235UO2F2 have a continuous DNA damage effect on the mouse lymphocytes, so that a significant stimulative effect on DNA repair capability in the cells is induced. The stimulative effect occurs only in a limited dose range, and the dose range of internally deposited 235UO2F2 is larger than that of the external radiation. The DNA repair synthesis is significantly inhibited after UV-irradiation in PHA stimulated but non-proliferating lymphocytes.