新型炭材料
新型炭材料
신형탄재료
NEW CARBON MATERIALS
2005年
4期
365-368
,共4页
柯泽豪%胡宪霖%丁志明%张营煌
柯澤豪%鬍憲霖%丁誌明%張營煌
가택호%호헌림%정지명%장영황
电子显微镜%孔隙率%微结构%类玻璃碳%炭化
電子顯微鏡%孔隙率%微結構%類玻璃碳%炭化
전자현미경%공극솔%미결구%류파리탄%탄화
Electron microscopy%Porosity%Microstructure%Glass-like carbon%Carbonization
主要探讨酚醛树脂为前驱物的类玻璃炭,在炭化及石墨化至2 400 ℃过程中,利用透射电子显微镜观察其微结构的变化.发现一些明显的微晶碳层平面完好地堆栈在孔洞周围,这些碳层结晶尺寸在20 nm~200 nm之间.同时,这些碳层平面排列十分整齐并延伸至孔洞的表面,这些排列完好的碳层平面主要是因在小分子物气化过程中所产生.这个气化反应会生成像石墨化应力的效果,导致在孔洞内部及边缘形成高结晶碳层平面.
主要探討酚醛樹脂為前驅物的類玻璃炭,在炭化及石墨化至2 400 ℃過程中,利用透射電子顯微鏡觀察其微結構的變化.髮現一些明顯的微晶碳層平麵完好地堆棧在孔洞週圍,這些碳層結晶呎吋在20 nm~200 nm之間.同時,這些碳層平麵排列十分整齊併延伸至孔洞的錶麵,這些排列完好的碳層平麵主要是因在小分子物氣化過程中所產生.這箇氣化反應會生成像石墨化應力的效果,導緻在孔洞內部及邊緣形成高結晶碳層平麵.
주요탐토분철수지위전구물적류파리탄,재탄화급석묵화지2 400 ℃과정중,이용투사전자현미경관찰기미결구적변화.발현일사명현적미정탄층평면완호지퇴잔재공동주위,저사탄층결정척촌재20 nm~200 nm지간.동시,저사탄층평면배렬십분정제병연신지공동적표면,저사배렬완호적탄층평면주요시인재소분자물기화과정중소산생.저개기화반응회생성상석묵화응력적효과,도치재공동내부급변연형성고결정탄층평면.
Phenolic resin was heat-treated up to 2 400 ℃ in an argon flow, leading to the formation of porous graphitized products. The microstructural changes in the graphitized phenolic resin were investigated by transmission electron microscopy. Some oval-shaped crystallites from 20 to 200 nm and with very regular order have been found, which extend to the surface of the pores. In general, the larger the pores, the larger are the crystallites inside them, and there are smaller crystallites between the larger crystallites. The formation of the crystallites is due to the gas evolution reaction, evaporation of which creates an effect analogous to stress graphitization, leading to these highly directional crystallites at the edges and inside the pores.