化学物理学报
化學物理學報
화학물이학보
CHINESE JOURNAL OF CHEMICAL PHYSICS
2006年
2期
152-154
,共3页
徐以锋%张寒洁%陈桥%李海洋%鲍世宁%何丕模
徐以鋒%張寒潔%陳橋%李海洋%鮑世寧%何丕模
서이봉%장한길%진교%리해양%포세저%하비모
八-羟基喹啉铝薄膜%光致发光%红移
八-羥基喹啉鋁薄膜%光緻髮光%紅移
팔-간기규람려박막%광치발광%홍이
Tris(8-hydroxyquinoline) aluminum film%Photoluminescence%Red-shift
通过原位测量对八-羟基喹啉铝薄膜(Alq3)光致发光的厚度依赖性质进行了研究.在Alq3向玻璃衬底沉积的初始阶段,Alq3光致发光谱峰发生了显著红移,此后谱峰随着Alq3厚度的增加红移变缓并趋于饱和.Alq3薄膜厚度从2 nm逐渐变化到500 nm时,Alq3谱峰位总红移约为12 nm.这种Alq3薄膜沉积的初始阶段Alq3谱峰的显著红移可归因于二维激子向三维激子态的转变.同时,由于激子同衬底的相互作用所引起的非辐射衰变,在Alq3沉积的初始阶段Alq3光致发光谱峰的强度呈现不同的变化,随后该谱峰的强度随Alq3薄膜厚度的增加而快速增加,并在薄膜厚度较大时,趋向于饱和.
通過原位測量對八-羥基喹啉鋁薄膜(Alq3)光緻髮光的厚度依賴性質進行瞭研究.在Alq3嚮玻璃襯底沉積的初始階段,Alq3光緻髮光譜峰髮生瞭顯著紅移,此後譜峰隨著Alq3厚度的增加紅移變緩併趨于飽和.Alq3薄膜厚度從2 nm逐漸變化到500 nm時,Alq3譜峰位總紅移約為12 nm.這種Alq3薄膜沉積的初始階段Alq3譜峰的顯著紅移可歸因于二維激子嚮三維激子態的轉變.同時,由于激子同襯底的相互作用所引起的非輻射衰變,在Alq3沉積的初始階段Alq3光緻髮光譜峰的彊度呈現不同的變化,隨後該譜峰的彊度隨Alq3薄膜厚度的增加而快速增加,併在薄膜厚度較大時,趨嚮于飽和.
통과원위측량대팔-간기규람려박막(Alq3)광치발광적후도의뢰성질진행료연구.재Alq3향파리츤저침적적초시계단,Alq3광치발광보봉발생료현저홍이,차후보봉수착Alq3후도적증가홍이변완병추우포화.Alq3박막후도종2 nm축점변화도500 nm시,Alq3보봉위총홍이약위12 nm.저충Alq3박막침적적초시계단Alq3보봉적현저홍이가귀인우이유격자향삼유격자태적전변.동시,유우격자동츤저적상호작용소인기적비복사쇠변,재Alq3침적적초시계단Alq3광치발광보봉적강도정현불동적변화,수후해보봉적강도수Alq3박막후도적증가이쾌속증가,병재박막후도교대시,추향우포화.
In situ thickness dependent photoluminescence (PL) measurements of tris(8-hydroxyquinoline) aluminum(Alq3) film were performed. At the beginning of Alq3 deposition on the glass substrate, the Alq3 emission showed a sharp red-shift. Further deposition of Alq3 resulted slight red-shift, and finally tended to saturated value. The total red-shift of about 12 nm was observed for the Alq3 film thickness range from 2 to 500 nm.This red-shift was attributed to the change from the 2D to 3D exciton state with increasing Alq3 film thickness. Meanwhile, the PL intensity of Alq3 emission increased continuously, and showed a rate change at the initial deposition of Alq3 due to non-rediative decay of excitons arised from the interaction between excitons and the substrate, and finally tended to saturation with the Alq3 thickness.