真空
真空
진공
VACUUM
2009年
4期
28-31
,共4页
黄晓辉%左秀荣%王齐伟%史新伟%李广钦%刘凤芹
黃曉輝%左秀榮%王齊偉%史新偉%李廣欽%劉鳳芹
황효휘%좌수영%왕제위%사신위%리엄흠%류봉근
磁控溅射%薄膜%3003铝箔%AlMo3%Al3Mo%TiAl%(Ti,Al)N
磁控濺射%薄膜%3003鋁箔%AlMo3%Al3Mo%TiAl%(Ti,Al)N
자공천사%박막%3003려박%AlMo3%Al3Mo%TiAl%(Ti,Al)N
magnetron sputtering%thin film%3003 aluminum foil%AlMo3%Al3Mo%TiAl%(Ti,Al)N
为有效提高3003铝箔表面光泽度、比面积及强硬度,采用直流反应磁控溅射的方法.在一定溅射参数条件下,选用高纯钼靶和钛靶对3003铝箔进行溅射实验,分别在铝箔表面主要沉积出AlMo3、Al3Mo薄膜和TiAl、(Ti,Al)N薄膜,利用X射线衍射、扫描电镜分析相组成及微观组织结构,并测试了显微硬度和薄膜厚度,实验结果表明:制备出的AlMo3、Al3Mo薄膜和TiAl薄膜结晶良好,与基底结合良好,铝箔表面美观漂亮、硬度增高及比表面积得到一定提高.
為有效提高3003鋁箔錶麵光澤度、比麵積及彊硬度,採用直流反應磁控濺射的方法.在一定濺射參數條件下,選用高純鉬靶和鈦靶對3003鋁箔進行濺射實驗,分彆在鋁箔錶麵主要沉積齣AlMo3、Al3Mo薄膜和TiAl、(Ti,Al)N薄膜,利用X射線衍射、掃描電鏡分析相組成及微觀組織結構,併測試瞭顯微硬度和薄膜厚度,實驗結果錶明:製備齣的AlMo3、Al3Mo薄膜和TiAl薄膜結晶良好,與基底結閤良好,鋁箔錶麵美觀漂亮、硬度增高及比錶麵積得到一定提高.
위유효제고3003려박표면광택도、비면적급강경도,채용직류반응자공천사적방법.재일정천사삼수조건하,선용고순목파화태파대3003려박진행천사실험,분별재려박표면주요침적출AlMo3、Al3Mo박막화TiAl、(Ti,Al)N박막,이용X사선연사、소묘전경분석상조성급미관조직결구,병측시료현미경도화박막후도,실험결과표명:제비출적AlMo3、Al3Mo박막화TiAl박막결정량호,여기저결합량호,려박표면미관표량、경도증고급비표면적득도일정제고.
By DC reactive magnetron sputtering,the AlMo3,Al3Mo,TiAl and (Ti,Al)N thin films were successfully deposited on 3003 aluminum foil as substrate with some selected sputtering parameters to improve experimentally the surface lustrousness,specific surface area and hardness/strength.The surface morphology and structure of the thin films were analyzed by scanning electron microscopy (SEM) and X-ray diffraction (XRD) with relevent microhardness and thickness measured.The results showed that the AlMo3/Al3Mo and TiAl/(Ti,Al)N thin films deposited are all crystallized well and bonded firmly to Al-base alloy substrate,with smooth and lustrous appearance,high hardness and large specific surface area provided.