CAJ | 학술논문

基于DILL经典曝光模型,对其分别在深度轴和时间轴上进行扩展:在深度轴上,以基尔霍夫衍射公式为基础,引入复折射率,利用光束传输法的思想计算了某曝光时刻下胶体内部的光场分布;在时间轴上,分析SU8光刻胶的特点及曝光反应过程,建立合适的光交联反应动力学模型,计算不同曝光时刻下的光场分布,通过整个曝光模型的建立,最终给出一定曝光时间后的光场分布;结果表明,在曝光阶段,胶内深层光场整体分布随时间变化不大,曝光时间对曝光阶段光场分布的影响较小,这种影响将在后烘阶段得以放大.
기우DILL경전폭광모형,대기분별재심도축화시간축상진행확전:재심도축상,이기이곽부연사공식위기출,인입복절사솔,이용광속전수법적사상계산료모폭광시각하효체내부적광장분포;재시간축상,분석SU8광각효적특점급폭광반응과정,건립합괄적광교련반응동역학모형,계산불동폭광시각하적광장분포,통과정개폭광모형적건립,최종급출일정폭광시간후적광장분포;결과표명,재폭광계단,효내심층광장정체분포수시간변화불대,폭광시간대폭광계단광장분포적영향교소,저충영향장재후홍계단득이방대.
Dill's classical exposure model on depth axis and time axis are generalized, respectively. On the depth axis, based on the Kirchhoff diffraction equation, complex-number-refraction-index was introduced, and the diffractive illumination distribution inside the resist at one moment was calculated by using the Beam Propagation Method (BPM) On the time axis, the characteristic of SU8 and its reaction course during exposure were analyzed, an appropriate chemical reaction kinetics model of the photocrosslinking reaction was built, and the diffractive illumination distribution at different moment was calculated. FinaUy, by building a kind of integrated exposure model, the diffractive illumination distribution after some exposure time was calculated. The results indicate that the illumination distribution variation with time inside the resist is not obvious and the impact of exposure time on illumination distribution is relatively low, which will be expanded during the post-exposure-hake process.