CAJ | 학술논문

针对使用半色调掩膜技术的TFT LCD玻璃基板曝光过程中的衍射和干涉现象进行了分析.文中给出了衍射和干涉现象的理论模型,并且对这两种现象在HTM技术中所起的作用进行了解释,尤其针对不同的狭缝宽度和狭缝间距的结构进行了分析.给出了扫描电镜的图片做为进一步的说明.
침대사용반색조엄막기술적TFT LCD파리기판폭광과정중적연사화간섭현상진행료분석.문중급출료연사화간섭현상적이론모형,병차대저량충현상재HTM기술중소기적작용진행료해석,우기침대불동적협봉관도화협봉간거적결구진행료분석.급출료소묘전경적도편주위진일보적설명.
Diffraction and interference phenomenon in the halftone mask fine pattern forming process was analyzed.The theoretical model of diffraction and interference was brought forward firstly and its effect at different HTM pattern forming process was explained,especially the patterns with various slit length and intervals.SEM graphs were also provided for the further demonstration.