功能材料与器件学报
功能材料與器件學報
공능재료여기건학보
JOURNAL OF FUNCTIONAL MATERIALS AND DEVICES
2010年
1期
11-16
,共6页
贺剑雄%武莉莉%夏庚培%郑家贵%冯良桓%雷智%李卫%张静全%黎兵
賀劍雄%武莉莉%夏庚培%鄭傢貴%馮良桓%雷智%李衛%張靜全%黎兵
하검웅%무리리%하경배%정가귀%풍량환%뢰지%리위%장정전%려병
AlSb%薄膜%磁控溅射法%退火
AlSb%薄膜%磁控濺射法%退火
AlSb%박막%자공천사법%퇴화
AlSb%film%magnetron sputtering%anneal
用磁控溅射法制备了Al/Sb多层薄膜,通过X射线衍射(XRD)、X射线荧光(XRF)、Hall效应、暗电导率温度关系及透过谱的测试研究了退火前后薄膜的结构和性质.XRD测试结果表明,刚沉积的薄膜只有Sb的结晶相,而Al则以非晶态形式存在,500℃退火后化合为AlSb多晶,且沿(111)择优取向.Hall效应测试、电导激活能及光能隙的计算结果表明,所制备的AlSb多晶薄膜为P型材料,且载流子浓度为10~(19) cm~(-3),光能隙为1.64eV,电导率随温度的变化可分为两个过程,在30℃到110℃,薄膜的电导率随温度的增加而缓慢增加,而在110℃到260℃间增加明显,升温电导激活能为0. 11eV和0.01eV,这与AlSb多晶薄膜在升温过程中的结构变化有关.将制备的AlSb多晶薄膜应用于TCO/CdS/AlSb/ZnTe:Cu/Au结构的太阳电池器件中,已观察到明显的光伏效应,说明用这种方法制备的AlSb多晶薄膜适于作太阳电池的吸收层.
用磁控濺射法製備瞭Al/Sb多層薄膜,通過X射線衍射(XRD)、X射線熒光(XRF)、Hall效應、暗電導率溫度關繫及透過譜的測試研究瞭退火前後薄膜的結構和性質.XRD測試結果錶明,剛沉積的薄膜隻有Sb的結晶相,而Al則以非晶態形式存在,500℃退火後化閤為AlSb多晶,且沿(111)擇優取嚮.Hall效應測試、電導激活能及光能隙的計算結果錶明,所製備的AlSb多晶薄膜為P型材料,且載流子濃度為10~(19) cm~(-3),光能隙為1.64eV,電導率隨溫度的變化可分為兩箇過程,在30℃到110℃,薄膜的電導率隨溫度的增加而緩慢增加,而在110℃到260℃間增加明顯,升溫電導激活能為0. 11eV和0.01eV,這與AlSb多晶薄膜在升溫過程中的結構變化有關.將製備的AlSb多晶薄膜應用于TCO/CdS/AlSb/ZnTe:Cu/Au結構的太暘電池器件中,已觀察到明顯的光伏效應,說明用這種方法製備的AlSb多晶薄膜適于作太暘電池的吸收層.
용자공천사법제비료Al/Sb다층박막,통과X사선연사(XRD)、X사선형광(XRF)、Hall효응、암전도솔온도관계급투과보적측시연구료퇴화전후박막적결구화성질.XRD측시결과표명,강침적적박막지유Sb적결정상,이Al칙이비정태형식존재,500℃퇴화후화합위AlSb다정,차연(111)택우취향.Hall효응측시、전도격활능급광능극적계산결과표명,소제비적AlSb다정박막위P형재료,차재류자농도위10~(19) cm~(-3),광능극위1.64eV,전도솔수온도적변화가분위량개과정,재30℃도110℃,박막적전도솔수온도적증가이완만증가,이재110℃도260℃간증가명현,승온전도격활능위0. 11eV화0.01eV,저여AlSb다정박막재승온과정중적결구변화유관.장제비적AlSb다정박막응용우TCO/CdS/AlSb/ZnTe:Cu/Au결구적태양전지기건중,이관찰도명현적광복효응,설명용저충방법제비적AlSb다정박막괄우작태양전지적흡수층.
The Al/Sb multi-layer thin films were prepared by magnetron sputtering method. The structural, optical and electrical properties of the films before and after annealing have been studied with X-ray diffraction (XRD), X-ray fluorescence (XRF), Hall effect, the temperature dependence of the film dark conductivity and UV-Vis transmission spectra. The XRD results showed that only the Sb polycrystalline peaks were observed in as-deposited films while Al existed in amorphous state. After annealing at 500℃, the films showed A1Sb peaks with (111) preferred orientation, which suggested that Al and Sb atoms have combined to form AlSb by interdiffusion. The measurement results of Hall effect indicated that the prepared AlSb films were p-type semiconductors with the carrier concentration of 10~(19)cm~(-3). The energy band-gap of the AlSb films obtained from UV – Vis data were about 1. 64eV. The temperature dependence of the film conductivity showed two stages. In the heating process from 30℃ to 110℃ , the conductivity of the film increased slowly with the temperature. In the stage from 110℃ to 260℃ , the film conductivity increased more quickly with the temperature. The calculated conductivity activation energy was 0. 01eV and 0. 11eV, respectively. This result had close relationship with the structural changes of the multi-layer Al/Sb films in the heating process. The obvious photovoltaic effect has been observed in TCO/CdS/AlSb/ZnTe:Cu/Au devices, which demonstrated the potential of AlSb as the absorber layer in solar cells.