用卢瑟福背散射/沟道技术及高分辨X射线衍射技术分析不同Al和In含量的AlInGaN薄膜的应变
용로슬복배산사/구도기술급고분변X사선연사기술분석불동Al화In함량적AlInGaN박막적응변
Strain in AlInGaN thin films caused by different contents of AI and In studied by Rutherford backscattering/Channeling and high resolution X-ray diffraction
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