CAJ | 학술논문

在近轴条件下,利用矩阵光学的方法研究了高功率高斯光束通过不同光学元件时,克尔效应导致的介质折射率的变化对鬼像位置的影响.计算了单个双凸透镜,单个双凹透镜以及4F系统中反射光线形成的低阶鬼像的位置移动,并将鬼像位置移动的规律表示为入射光束束腰和峰值光强的函数.
재근축조건하,이용구진광학적방법연구료고공솔고사광속통과불동광학원건시,극이효응도치적개질절사솔적변화대귀상위치적영향.계산료단개쌍철투경,단개쌍요투경이급4F계통중반사광선형성적저계귀상적위치이동,병장귀상위치이동적규률표시위입사광속속요화봉치광강적함수.
Applying matrix optics to paraxial rays, which travel through different optical elements illuminated with high-power Gaussian beams, the positions of ghost images affected by Kerr-effect-induced nonlinear refractive index of the illuminated optics are studied. Calculations are made on the position shifts of several low-order ghost images arising from spacious reflections at surfaces defining an isolated convexo-convex lens, concavo-concave lens, and optics forming the so-called 4F system. The variation rules of the position shifts are quantitatively shown as functions of the beam waist radius and the beam peak intensities.