真空科学与技术学报
真空科學與技術學報
진공과학여기술학보
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY
2010年
2期
106-110
,共5页
张粲%丁万昱%王华林%柴卫平
張粲%丁萬昱%王華林%柴衛平
장찬%정만욱%왕화림%시위평
磁控溅射%TiO_2薄膜%O_2/Ar比例%光催化性能
磁控濺射%TiO_2薄膜%O_2/Ar比例%光催化性能
자공천사%TiO_2박막%O_2/Ar비례%광최화성능
Magnetron sputtering%TiO_2 films%O_2/Ar flow ratio%Photocatalysis
利用直流脉冲磁控溅射方法在不同O_2/Ar比例条件下制备具有不同结构、性能的TiO_2薄膜,利用台阶仪、X射线衍射仪及紫外-可见分光光度计等仪器,对薄膜的结构、透光性能、光催化性能等进行表征.研究结果表明:TiO_2薄膜的结构、光催化性能等强烈依赖于沉积过程中的O_2/Ar比例.在低O_2/Ar比例条件下制备的TiO_2薄膜,薄膜处于O控制生长阶段,相应薄膜处于高速生长状态,薄膜经退火处理后形成锐钛矿(101)相择优取向结构,同时薄膜对甲基橙溶液降解率较低.随着O_2/Ar比例的增加,薄膜生长速率逐渐降低,薄膜逐渐呈现多相混合生长,经退火处理后薄膜呈现锐钛矿(101)相与(004)相的混合相结构,相应薄膜对甲基橙溶液降解率增加,在O_2/Ar比为6/14时,其对甲基橙溶液降解率达到最大值,为86.45%.继续增加O_2/Ar比例,在高O_2/Ar比例条件下,薄膜沉积速率较低,沉积离子有充足的驰豫时间释放自身能量以寻找低能位置,因此在薄膜沉积过程中主要形成能量最低的锐钛矿(101)相结构,经退火处理后薄膜呈现锐钛矿(101)相择优取向结构,在O_2/Ar比为20/0时,薄膜对甲基橙溶液降解率下降至52.15%.
利用直流脈遲磁控濺射方法在不同O_2/Ar比例條件下製備具有不同結構、性能的TiO_2薄膜,利用檯階儀、X射線衍射儀及紫外-可見分光光度計等儀器,對薄膜的結構、透光性能、光催化性能等進行錶徵.研究結果錶明:TiO_2薄膜的結構、光催化性能等彊烈依賴于沉積過程中的O_2/Ar比例.在低O_2/Ar比例條件下製備的TiO_2薄膜,薄膜處于O控製生長階段,相應薄膜處于高速生長狀態,薄膜經退火處理後形成銳鈦礦(101)相擇優取嚮結構,同時薄膜對甲基橙溶液降解率較低.隨著O_2/Ar比例的增加,薄膜生長速率逐漸降低,薄膜逐漸呈現多相混閤生長,經退火處理後薄膜呈現銳鈦礦(101)相與(004)相的混閤相結構,相應薄膜對甲基橙溶液降解率增加,在O_2/Ar比為6/14時,其對甲基橙溶液降解率達到最大值,為86.45%.繼續增加O_2/Ar比例,在高O_2/Ar比例條件下,薄膜沉積速率較低,沉積離子有充足的馳豫時間釋放自身能量以尋找低能位置,因此在薄膜沉積過程中主要形成能量最低的銳鈦礦(101)相結構,經退火處理後薄膜呈現銳鈦礦(101)相擇優取嚮結構,在O_2/Ar比為20/0時,薄膜對甲基橙溶液降解率下降至52.15%.
이용직류맥충자공천사방법재불동O_2/Ar비례조건하제비구유불동결구、성능적TiO_2박막,이용태계의、X사선연사의급자외-가견분광광도계등의기,대박막적결구、투광성능、광최화성능등진행표정.연구결과표명:TiO_2박막적결구、광최화성능등강렬의뢰우침적과정중적O_2/Ar비례.재저O_2/Ar비례조건하제비적TiO_2박막,박막처우O공제생장계단,상응박막처우고속생장상태,박막경퇴화처리후형성예태광(101)상택우취향결구,동시박막대갑기등용액강해솔교저.수착O_2/Ar비례적증가,박막생장속솔축점강저,박막축점정현다상혼합생장,경퇴화처리후박막정현예태광(101)상여(004)상적혼합상결구,상응박막대갑기등용액강해솔증가,재O_2/Ar비위6/14시,기대갑기등용액강해솔체도최대치,위86.45%.계속증가O_2/Ar비례,재고O_2/Ar비례조건하,박막침적속솔교저,침적리자유충족적치예시간석방자신능량이심조저능위치,인차재박막침적과정중주요형성능량최저적예태광(101)상결구,경퇴화처리후박막정현예태광(101)상택우취향결구,재O_2/Ar비위20/0시,박막대갑기등용액강해솔하강지52.15%.
The TiO_2 films were deposited by DC-pulsed magnetron sputtering at room temperature on glass substrates.The microstructures and properties of the films were characterized X-ray diffraction,atomic force microscopy,ultraviolet visible (UV-Vis) spectroscopy and conventional probes.The influence of film growth conditions on the film property was studied.The results show that the O_2/Ar flow rate ratio significantly affects the microstructures and photocatalytic activity of the TiO_2 films.For instance,at a low ratio of O_2/Ar flow rate,the anatase-phased,(101)oriented TiO_2 films forms.As the ratio increases to 6/14,its photocatalytic activity in degradation of methyl orange solution maximizes at 86.45%,and then decreases;as the ratio continues to increase,the deposition rate decreases,the low energy (101) anatase-phase forms,and an (101)preferred orientation can be clearly observed after annealing.At O_2/Ar=20/0,its degradation rate drops to 52.15%.