CAJ | 학술논문

用高频等离子体作为热源,采用化学气相沉积法合成了石英玻璃样品.实验分别使用02和空气作为等离子体电离气体和冷却保护气体,改变等离子体电离工作气体种类时,等离子体火焰长度和石英玻璃沉积温度变化较大,而灯具冷却保护气体的改变对等离子火焰长度和石英玻璃沉积温度的影响不大.当等离子体电离气体和灯具保护气体均为O2时,等离子体火焰长度为12cm,石英基体温度为1 300℃,当等离子体电离气体和灯具保护气体均为空气时,等离子体火焰长度可达24cm,石英基体温度升高到l 840℃,可确保气相沉积过程进行,合成的石英玻璃在波长190nm处光透过率达84%,羟基含量3.5×10-6,可达到全光谱透过的要求.
용고빈등리자체작위열원,채용화학기상침적법합성료석영파리양품.실험분별사용02화공기작위등리자체전리기체화냉각보호기체,개변등리자체전리공작기체충류시,등리자체화염장도화석영파리침적온도변화교대,이등구냉각보호기체적개변대등리자화염장도화석영파리침적온도적영향불대.당등리자체전리기체화등구보호기체균위O2시,등리자체화염장도위12cm,석영기체온도위1 300℃,당등리자체전리기체화등구보호기체균위공기시,등리자체화염장도가체24cm,석영기체온도승고도l 840℃,가학보기상침적과정진행,합성적석영파리재파장190nm처광투과솔체84%,간기함량3.5×10-6,가체도전광보투과적요구.
Silica glass was synthesized by plasma chemical vapor deposition method, which uses inductively coupled plasma as theheat source. Air and oxygen were separately used as ionized gas and protecting gas. The influence of ionized gases on the length ofplasma flame and the temperature of substrate is more significant than that of the protecting gases. A length of 24 cm plasma flameand a deposition temperature of 1 300 ℃ were obtained when oxygen was used as both ionized gases and protecting gases, but in thecase of air, the length of plasma flame was 24 cm and the deposition temperature was 1 840 ℃. Both of the longer plasma flame andthe higher deposition temperature offered a good condition to deposit high quality silica glass. The silica glass has 84% transmittanceat a wavelength of 190 nm and 3.5 10-6 of the hydroxyl group, which is the glass of full-spectrum transmittance.