CAJ | 학술논문

用射频反应溅射法制备出BCN薄膜．X射线衍射和傅立叶红外吸收光谱测量发现样品的组成原子之间实现了原子级化合，样品与Si衬底之间存在较大的应力．样品剥落后，应力的消除使红外吸收峰位向低波数移动．实验还发现，衬底材料对样品中的压应力影响很大，压应力的释放与衬底密切相关：在硅衬底上呈枫叶状隆起，在石英衬底上样品呈周期性的折线状隆起．
용사빈반응천사법제비출BCN박막．X사선연사화부립협홍외흡수광보측량발현양품적조성원자지간실현료원자급화합，양품여Si츤저지간존재교대적응력．양품박락후，응력적소제사홍외흡수봉위향저파수이동．실험환발현，츤저재료대양품중적압응력영향흔대，압응력적석방여츤저밀절상관：재규츤저상정풍협상륭기，재석영츤저상양품정주기성적절선상륭기．
BCN thin films were grow n by RF reactive sputtering. XRD andFTIR measurements suggested that there was a larger stress between the films and Si substrate. When the films were peeled off the substrate, stress relaxes and the IR absorption peaks shifted to lower w ave numbers. Also, it was found that substrates play an important role in the fo rmation of the stress, and the stress relaxation was dependent on the used subst rates: on Si substrate, the pattern of the stress relaxation looked like maple- leaves; on quartz substrate, it looked like periodically distributed broken line s.