CAJ | 학술논문

以乙酰丙酮铱为前驱体,采用金属有机化合物化学气相沉积(MOCVD)技术在Mo基体上制备Ir薄膜.研究Ir的沉积效果与沉积温度及反应气体(O_2)间的关系.Ir薄膜的沉积速率与沉积温度之间的关系不符合Arrhenius方程,沉积速率与沉积温度绝对温度的倒数呈抛物线关系,当温度为750 ℃时,Ir的沉积速率达到最大值,沉积温度对Ir薄膜的显微形貌有显著影响;O_2的流量对薄膜的成分、形貌及结构等均有显著影响.
이을선병동의위전구체,채용금속유궤화합물화학기상침적(MOCVD)기술재Mo기체상제비Ir박막.연구Ir적침적효과여침적온도급반응기체(O_2)간적관계.Ir박막적침적속솔여침적온도지간적관계불부합Arrhenius방정,침적속솔여침적온도절대온도적도수정포물선관계,당온도위750 ℃시,Ir적침적속솔체도최대치,침적온도대Ir박막적현미형모유현저영향;O_2적류량대박막적성분、형모급결구등균유현저영향.
Ir films were deposited on molybdenum substrates by MOCVD using iridium tri-acetylacetonate as precursors. The effects of deposition temperature and oxygen on deposition effectiveness of iridium were discussed. The relationship between the deposition rate and the deposition temperature does not accord with Arrhenius formula; however, there exists a parabola relation between them. The deposition rate of iridium will reach maximum at 750 ℃. The deposition temperature greatly affects the film properties. The component, the surface morphology and the structure of Ir films will be influenced by the addition of oxygen.