CAJ | 학술논문

以本实验室制备的高性能减反膜为研究对象，利用溶胶一凝胶法合成SiO：溶液，采用高速旋涂法制备纳米多孔SiO2减反膜，测试结果表明涂覆在白玻基材上的减反膜在可见光波段（400～800nm）范围内的透过率为94．6％±0．3％，其在405nm波长处的透过率达到1198．27％；同时进一步研究了热处理工艺在减反膜涂覆阶段对其减反性能的影响，研究发现：如果在基材表面涂覆一定厚度的减反膜，不同的热处理工艺对其的减反效果影响很大；如果热处理工艺选择不当，会使最终得到的涂层失去减反效能，甚至大幅度降低基材本身的透过率，为84．9％±1．1％。
이본실험실제비적고성능감반막위연구대상，이용용효일응효법합성SiO：용액，채용고속선도법제비납미다공SiO2감반막，측시결과표명도복재백파기재상적감반막재가견광파단（400～800nm）범위내적투과솔위94．6％±0．3％，기재405nm파장처적투과솔체도1198．27％；동시진일보연구료열처리공예재감반막도복계단대기감반성능적영향，연구발현：여과재기재표면도복일정후도적감반막，불동적열처리공예대기적감반효과영향흔대；여과열처리공예선택불당，회사최종득도적도층실거감반효능，심지대폭도강저기재본신적투과솔，위84．9％±1．1％。
In this paper, we used the high performance antireflective （AR） film composed of nanostructure porous Si02 particles as the research object which was prepared in our laboratory by sol-gel spin-coating process. The transmittance of the AR film （on the substrate） is 94.6 ＋ 0.3 % at the waveband range from 400nm to 800nm, and which is 98.27% at 405nm. The heat treatment process for the performance of AR film in its coating stage was studied. If there was a certain thickness of AR film on the substrate surface, the performance of AR film was affected greatly by the different heat treatment process. The transmittance of the AR film was 84.9- 1.1% by choosing the inappropriate heat treatment process, which could lose the AR effectiveness ultimately and was less than the substrate itself.