CAJ | 학술논문

描述了一台大面积双叠层阳极在X、Y方向分条读出气体电离室而发展的大面积真空镀膜装置。镀膜腔体内体积为990mm×780mm×780mm。可镀膜面积最大为960mm×750mm。用该装置为RIBLL电离室镀阴极、X阳极、Y阳极和窗,镀膜面积440mm×160mm,Mylar膜厚3.26μm,镀银97.27nm,镀银厚度不均匀度为18.91％。用它制作的RIBLL电离室的阳极、阴极,当电离室工作气压25kPaP10气体,阳极电压220V,阴极电压－1600V时,对5.15MeVα源测量能量分辨率为4.2％。
묘술료일태대면적쌍첩층양겁재X、Y방향분조독출기체전리실이발전적대면적진공도막장치。도막강체내체적위990mm×780mm×780mm。가도막면적최대위960mm×750mm。용해장치위RIBLL전리실도음겁、X양겁、Y양겁화창,도막면적440mm×160mm,Mylar막후3.26μm,도은97.27nm,도은후도불균균도위18.91％。용타제작적RIBLL전리실적양겁、음겁,당전리실공작기압25kPaP10기체,양겁전압220V,음겁전압－1600V시,대5.15MeVα원측량능량분변솔위4.2％。
A large area vacuum-silver-plated equipment is described. It wassteup in constructing two-fold ionizing chamber with anodes tripped readout of RIBLL. The dimension of vacuum chamber is 990mm×780mm ×780mm. The maximun area of Mylar foil plated is about 960mm×750mm. The cathode, anodes- tipped and windows of two-fold IC had been plated with Ag in this equipment, The area of Mylar foils are 440mm×160mm. Thickness of Mylar is 3.26μm and thickness of Ag-plated is 97.27nm in average. The relative dispersion of thickness in the siver-plated is 18.91％. The IC with cathode and anodes-tripped Ag-plated of RIBLL was measured. When the pressure of P10 operating gas is 25kPa ,the cathode is set at －1600V and the anodes are at 200V, the energy resolution 4.2％ for 5. 15MeV α particle is obtained.