CAJ | 학술논문

根据军用光学仪器的使用要求,在多光谱ZnS基底上镀制增透膜,要求薄膜在可见与近红外波段400～1000 nm及远红外波段7～11 μm的平均透射率均大于90%.采用电子束真空镀膜的方法并加以离子辅助沉积系统,通过选择ZnS和YbF3作为高低折射率材料,利用最新OptilLayer软件三大模块的功能辅助,调整镀膜工艺参数,改进监控方法,减少膜厚控制误差,在多光谱ZnS基底上成功镀制符合使用要求的增透膜.所镀膜层在可见与近红外波段400～1000 nm的平均透射率大于91%,远红外波段7～11μm的平均透射率大于90%,能够承受恶劣的环境测试,完全满足军用光学仪器的使用要求.
근거군용광학의기적사용요구,재다광보ZnS기저상도제증투막,요구박막재가견여근홍외파단400～1000 nm급원홍외파단7～11 μm적평균투사솔균대우90%.채용전자속진공도막적방법병가이리자보조침적계통,통과선택ZnS화YbF3작위고저절사솔재료,이용최신OptilLayer연건삼대모괴적공능보조,조정도막공예삼수,개진감공방법,감소막후공제오차,재다광보ZnS기저상성공도제부합사용요구적증투막.소도막층재가견여근홍외파단400～1000 nm적평균투사솔대우91%,원홍외파단7～11μm적평균투사솔대우90%,능구승수악렬적배경측시,완전만족군용광학의기적사용요구.
In order to meet the military instruments' operating requirements, An antireflection coating on the substrate of ZnS at 400～1000 nm (visible and near infrared band) and 7 ～ 11 μm (far infrared band) is deposited, it requires a average transmittance over 90%. Electronic beaming vacuum depositing method is adopted with the aid of ion assistant deposition systems as well as chose ZnS as the material of high refractive index and YbF_3 as the material of low refractive index. Using three modular processing systems of the latest optilayer software as assistance, optimizing technical parameters, and improving monitor method, reducing thickness error, antireflection coating on the substrate of ZnS to achieve the requirements have be deposited. The average transmittance exceeds 91% through 400～ 1000 nm wavelength. Moreover, it makes the transmittance over 90% through 7 ～ 11 μm wavelength. In addition, the film can resist harsh environment and completely meet the demands of military optical instruments.