CAJ | 학술논문

本文通过建立多尺度模型,结合模拟了磁控溅射中溅射原子的产生、溅射原子的碰撞传输、以及最终成膜的全过程,研究了基板温度、溅射速率、磁场分布和靶材-基板间距对薄膜生长过程与薄膜性能的影响.模拟结果显示,提高基板温度或降低溅射速率都会增加初期生长阶段薄膜的相对密度;磁场对靶的利用率有显著的影响,而对薄膜最终形貌的影响不大;增大靶材-基板间距会降低薄膜的粗糙度.
본문통과건립다척도모형,결합모의료자공천사중천사원자적산생、천사원자적팽당전수、이급최종성막적전과정,연구료기판온도、천사속솔、자장분포화파재-기판간거대박막생장과정여박막성능적영향.모의결과현시,제고기판온도혹강저천사속솔도회증가초기생장계단박막적상대밀도;자장대파적이용솔유현저적영향,이대박막최종형모적영향불대;증대파재-기판간거회강저박막적조조도.
The various aspects of the complete films growth process,including generation of the sputtercd atoms,its collision and scattering,its deposition,formation of clusters,and film growth,were simulated with the newly-developed multi-scale model,by a combination of particle-in-cells (PIC),Monte Carlo and clouds-in-cell (CIC) methods.The impacts of film growth conditions,such as the substrate temperature,deposition rate,magnetic field distributions,and separation between target and substrate,on film growth and properties were analytically studied.The simulated results show that the substrate temperature and the deposition rate strongly affect the initial stage of the film growth.For example,higher temperature and lower deposition rate results in denser and more compact films.Large target-substrate distance reduces the surfaces roughness;and the magnetic field distribution significantly influenccs target utilization rate,but has little effect on the final film topagraphy.