CAJ | 학술논문

研究了N2和N2/NH3混合气两种不同气氛快速退火处理硅片对洁净区和氧沉淀分布的影响.研究发现:N2/NH3混合气氛处理的硅片在后序热处理中表层形成很薄的洁净区同时体内形成高密度的氧沉淀;而N2气氛处理的硅片的沽净区较厚、氧沉淀密度较低.但是两种气氛下延长恒温时间都可以降低洁净区厚度,增加氧沉淀密度.X射线光电子能谱和原子力显微镜扫描的结果显示N2/NH3混合气氛处理使表面出现了强烈的氮化反应,利用氮化反应町以解释快速退火气氛对洁净区分布的影响.
연구료N2화N2/NH3혼합기량충불동기분쾌속퇴화처리규편대길정구화양침정분포적영향.연구발현:N2/NH3혼합기분처리적규편재후서열처리중표층형성흔박적길정구동시체내형성고밀도적양침정;이N2기분처리적규편적고정구교후、양침정밀도교저.단시량충기분하연장항온시간도가이강저길정구후도,증가양침정밀도.X사선광전자능보화원자력현미경소묘적결과현시N2/NH3혼합기분처리사표면출현료강렬적담화반응,이용담화반응정이해석쾌속퇴화기분대길정구분포적영향.
The effect of rapid thermal annealing (RTA) ambient on denuded zone and oxygen precipitates in Czochralski(CZ) silicon wafers is studied in this paper. N2 and a N2/NH3 mixture are used as RTA ambient. It is demonstrated that ahigh density of oxygen precipitates and thin denuded zone are obtained in N2/NH3 ambient,while a relatively lower densi-ty of oxygen precipitates and thicker denuded zone are observed in N2 ambient. As the RTA duration times increased, theoxygen precipitate density increased and the denuded zone depth decreased. X-ray photoelectron spectroscopy (XPS) dataand atomic force microscope (AFM) results show that there was a surface nitriding reaction during the N2/NH3 ambientRTA process, which can explain the different effect of RTA ambient.