CAJ | 학술논문

利用Monte Carlo方法研究了基底显微结构对薄膜生长的影响.对不同显微结构基底上薄膜生长的初始阶段岛的形貌和尺寸与薄膜覆盖度和入射粒子沉积速率之间的关系进行了模拟和分析.模型中考虑了粒子沉积、吸附粒子扩散和蒸发等过程.结果表明,基底显微结构对薄膜生长具有明显影响.当沉积温度为300 K、沉积速率为0.005 ML/s(Monolayer/second,简称ML/s)、覆盖度为0.05 ML时,四方基底上薄膜生长呈现凝聚生长.随着覆盖度增加,岛的尺寸变大,岛的数目减少.而对于六方基底,当覆盖度从0.05 ML变化到0.25 ML时,薄膜生长经历了一个从分散生长过渡到分形生长的过程.无论是四方还是六方基底,随着沉积速率的增加,岛的形貌由少数聚集型岛核分布状态向众多各自独立的离散型岛核分布状态过渡.
이용Monte Carlo방법연구료기저현미결구대박막생장적영향.대불동현미결구기저상박막생장적초시계단도적형모화척촌여박막복개도화입사입자침적속솔지간적관계진행료모의화분석.모형중고필료입자침적、흡부입자확산화증발등과정.결과표명,기저현미결구대박막생장구유명현영향.당침적온도위300 K、침적속솔위0.005 ML/s(Monolayer/second,간칭ML/s)、복개도위0.05 ML시,사방기저상박막생장정현응취생장.수착복개도증가,도적척촌변대,도적수목감소.이대우륙방기저,당복개도종0.05 ML변화도0.25 ML시,박막생장경력료일개종분산생장과도도분형생장적과정.무론시사방환시륙방기저,수착침적속솔적증가,도적형모유소수취집형도핵분포상태향음다각자독립적리산형도핵분포상태과도.
The effect of the substrate microstructure on the thin film growth is studied by Monte Carlo method.The change of the island morphology and size at the early stage of the thin film growth with coverage and deposition rate on different microstructure substrates are simulated and analyzed.In our model,three processes are considered:particle deposition,adatom diffusion and adatom reevaporation.The result shows that the microstructure of the substrate has an obvious effect on the thin film growth.With the coverage of 0.05 ML,the thin film growth on the tetragonal substrate has been taken on condensation at the temperature of 300 K and the deposition rate of 0.005 ML/s（Monolayer/second,ML/s）.With coverage increasing,the mean size of islands becomes larger and its number is decreased.But for the hexagonal substrate,the island growth transits from sporadic to fractal shape with coverage increasing from 0.05 ML to 0.25 ML.With increase of deposition rate,facial morphology of the thin film on the tetragonal and hexagonal substrates changes from distributing state of collective and handful islands to one of numerous and discrete islands.