CAJ | 학술논문

采用短波紫外光(UV)在十八烷基三氯硅烷(OTS)自组装单分子层刻蚀不同的微型图案,利用液相自组装技术在OTS模板表面沉积HfO_2图案化薄膜.通过XRD、AFM、SEM、EDS等测试手段对OTS膜和HfO_2薄膜进行表征,结果表明:以OTS为模板利用液相自组装技术成功制备出边缘轮廓清晰、粗糙度较小、条纹宽度为10μm的立方品型的HfO_2图案化薄膜.
채용단파자외광(UV)재십팔완기삼록규완(OTS)자조장단분자층각식불동적미형도안,이용액상자조장기술재OTS모판표면침적HfO_2도안화박막.통과XRD、AFM、SEM、EDS등측시수단대OTS막화HfO_2박막진행표정,결과표명:이OTS위모판이용액상자조장기술성공제비출변연륜곽청석、조조도교소、조문관도위10μm적립방품형적HfO_2도안화박막.
Different kinds of micro-patterns were created within octadecyltrichlorosilane (OTS) self-assembled monolayers utilizing UV lithography. The HfO_2 pattern films have been formed on silanol SAMs by the liquid-phase deposition (LPD) method. The crystal phase composition, microstructure and topography oi the as-prepared films were characterized by various techniques, including X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), and energy disperse spectroscopy (EDS). The results indicate that the HfO_2 pattern films were successfully prepared by the self-assembled monolayers, and the thin films had cubic pattern microstructure of HfO_2, 10 μm deposited lines width and small line edge roughness.