CAJ | 학술논문

采用直流电沉积法,在低碳钢表面成功沉积Ni-W-P镀层.应用X射线荧光(XRF)、扫描电子显微镜(SEM)、俄歇电子能谱(AES)、X射线衍射(XRD)仪等方法,研究电流密度、镀液pH值和镀液温度对Ni-W-P镀层成分、表面形貌和结构的影响.结果表明,电流密度和镀液pH值的变化对Ni-W-P镀层成分的影响很大,而电流密度、镀液pH值和温度对镀层厚度的影响较小.电流效率随着电流密度和镀液温度的增大分别降低和升高,而随着镀液pH值的变化,在pH=7.0时有极大值.镀液pH值对Ni-W-P镀层结构有较大影响,在pH=8.0时,镀层呈现明显的Ni(111)峰,此时镀层硬度达到极大值7130 MPa.在此基础上,对Ni-W-P镀层的电沉积机制做了进一步探讨.
채용직류전침적법,재저탄강표면성공침적Ni-W-P도층.응용X사선형광(XRF)、소묘전자현미경(SEM)、아헐전자능보(AES)、X사선연사(XRD)의등방법,연구전류밀도、도액pH치화도액온도대Ni-W-P도층성분、표면형모화결구적영향.결과표명,전류밀도화도액pH치적변화대Ni-W-P도층성분적영향흔대,이전류밀도、도액pH치화온도대도층후도적영향교소.전류효솔수착전류밀도화도액온도적증대분별강저화승고,이수착도액pH치적변화,재pH=7.0시유겁대치.도액pH치대Ni-W-P도층결구유교대영향,재pH=8.0시,도층정현명현적Ni(111)봉,차시도층경도체도겁대치7130 MPa.재차기출상,대Ni-W-P도층적전침적궤제주료진일보탐토.
Ni-W-P layers were formed on a low-carbon steel substrate by direct-current electroplating method. The effects of current density, pH value and bath temperature on the composition, surface morphology, and microstructure of Ni-W-P layers were studied by X-ray fluorescence (XRF), scanning electron microscope (SEM), auger electron spectroscopy (AES) and X-ray diffraction (XRD). The results indicate that the change of current density and pH value influenced the composition of Ni-W-P layer greatly, but the change of current density, pH value and bath temperature hardly influenced the thickness of Ni-W-P layer. As current density and bath temperature increased, current efficiency decreased and increased, respectively, and current efficiency reached the maximum value when pH value is 7.0. The structure of Ni-W-P layer was greatly influenced by pH value, and a well-preferred orientation along Ni (111) direction was shown when pH value was 8.0. Synchronously, the microhardness of Ni-W-P layer reached the maximum value of 7130 MPa. At last, electroplating mechanism of Ni-W-P layer was discussed further.