人工晶体学报
人工晶體學報
인공정체학보
2009年
6期
1477-1480
,共4页
碱金属%射频磁控溅射%ZnO薄膜%光致发光
堿金屬%射頻磁控濺射%ZnO薄膜%光緻髮光
감금속%사빈자공천사%ZnO박막%광치발광
alkali metal%RF magnetron sputtering%ZnO thin films%photoluminescence
采用固相反应法制备了不同比例的碱金属掺杂ZnO靶材,并利用磁控溅射法在Si(111)基片上制备不同温度下生长的c轴择优取向ZnO薄膜.通过XRD、AFM和荧光光谱(PL谱)研究了掺杂元素和掺杂比例对薄膜结构和发光特性的影响.结果表明,掺杂未改变ZnO的结构,薄膜具有很好的c轴择优取向.室温下用325 nm的氙灯作为激发光源得到不同样品的 PL 谱,分析表明,紫外发光峰来源于自由激子的复合辐射与带间跃迁,蓝绿发光峰与锌缺陷和氧缺陷有关.此外还探讨了紫外发光峰红移的可能机理.
採用固相反應法製備瞭不同比例的堿金屬摻雜ZnO靶材,併利用磁控濺射法在Si(111)基片上製備不同溫度下生長的c軸擇優取嚮ZnO薄膜.通過XRD、AFM和熒光光譜(PL譜)研究瞭摻雜元素和摻雜比例對薄膜結構和髮光特性的影響.結果錶明,摻雜未改變ZnO的結構,薄膜具有很好的c軸擇優取嚮.室溫下用325 nm的氙燈作為激髮光源得到不同樣品的 PL 譜,分析錶明,紫外髮光峰來源于自由激子的複閤輻射與帶間躍遷,藍綠髮光峰與鋅缺陷和氧缺陷有關.此外還探討瞭紫外髮光峰紅移的可能機理.
채용고상반응법제비료불동비례적감금속참잡ZnO파재,병이용자공천사법재Si(111)기편상제비불동온도하생장적c축택우취향ZnO박막.통과XRD、AFM화형광광보(PL보)연구료참잡원소화참잡비례대박막결구화발광특성적영향.결과표명,참잡미개변ZnO적결구,박막구유흔호적c축택우취향.실온하용325 nm적선등작위격발광원득도불동양품적 PL 보,분석표명,자외발광봉래원우자유격자적복합복사여대간약천,람록발광봉여자결함화양결함유관.차외환탐토료자외발광봉홍이적가능궤리.
The compounds of ZnXO (X=Li, Na and K) were prepared by a convention solid reaction method and the highly c-axis oriented ZnXO (X=Li, Na and K) thin films were deposited on Si (111) substrates by magnetron sputtering method. The structures,surface morphology and the luminescent properties of thin films were measured by X-ray diffraction(XRD), atomic force microscopes(AFM) and photoluminescence(PL).The results indicated that the ZnXO thin films show good c-axis orientation. Different PL spectra were acquired at room temperature using xenon lamps as excitation light sources, with excitation wavelengths of 325 nm. The UV peaks and violet peaks were found to originate from free excition radiation recombination and the PL intensity was related to crystalline quality, and the blue-green peaks may be related to the zinc and oxygen vacancies. The physical mechanism was disscussed throngh which the red shift of UV PL peaks.