功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2009年
12期
2000-2003
,共4页
锗掺杂%TiO_2薄膜%光电化学性能%溶胶凝胶法
鍺摻雜%TiO_2薄膜%光電化學性能%溶膠凝膠法
타참잡%TiO_2박막%광전화학성능%용효응효법
Ge doping%TiO_2 films%photoelectrochemical properties%sol-gel method
二氧化钛是一种无毒、廉价、稳定的半导体材料,被广泛用作光电化学太阳能电池的电极材料,适当掺杂可以增强其光电性能.以钛酸丁酯和四正丁氧基锗烷为主要原料,采用溶胶-凝胶提拉涂膜法制备了Ge掺杂的TiO_2薄膜.通过X射线衍射、扫描电镜、紫外-可见吸收光谱、电流-电压曲线等测试手段研究了薄膜的结晶性能、微观结构和光电性能随Ge掺杂量的变化规律.结果表明,Ge掺杂量x=0.10时,形成Ti_(1-x)Ge_xO_2固溶体,x=0.15时,形成非晶态.掺锗后薄膜表面颗粒密度增大,薄膜比较致密.随着Ge掺杂量的增加,吸收光谱吸收边蓝移,光电化学性能也得到一定提高.在Ge掺杂量为0.05时,光电流达到最大值17A/m~2.同时,研究了锗掺杂对光电流的影响.
二氧化鈦是一種無毒、廉價、穩定的半導體材料,被廣汎用作光電化學太暘能電池的電極材料,適噹摻雜可以增彊其光電性能.以鈦痠丁酯和四正丁氧基鍺烷為主要原料,採用溶膠-凝膠提拉塗膜法製備瞭Ge摻雜的TiO_2薄膜.通過X射線衍射、掃描電鏡、紫外-可見吸收光譜、電流-電壓麯線等測試手段研究瞭薄膜的結晶性能、微觀結構和光電性能隨Ge摻雜量的變化規律.結果錶明,Ge摻雜量x=0.10時,形成Ti_(1-x)Ge_xO_2固溶體,x=0.15時,形成非晶態.摻鍺後薄膜錶麵顆粒密度增大,薄膜比較緻密.隨著Ge摻雜量的增加,吸收光譜吸收邊藍移,光電化學性能也得到一定提高.在Ge摻雜量為0.05時,光電流達到最大值17A/m~2.同時,研究瞭鍺摻雜對光電流的影響.
이양화태시일충무독、렴개、은정적반도체재료,피엄범용작광전화학태양능전지적전겁재료,괄당참잡가이증강기광전성능.이태산정지화사정정양기타완위주요원료,채용용효-응효제랍도막법제비료Ge참잡적TiO_2박막.통과X사선연사、소묘전경、자외-가견흡수광보、전류-전압곡선등측시수단연구료박막적결정성능、미관결구화광전성능수Ge참잡량적변화규률.결과표명,Ge참잡량x=0.10시,형성Ti_(1-x)Ge_xO_2고용체,x=0.15시,형성비정태.참타후박막표면과립밀도증대,박막비교치밀.수착Ge참잡량적증가,흡수광보흡수변람이,광전화학성능야득도일정제고.재Ge참잡량위0.05시,광전류체도최대치17A/m~2.동시,연구료타참잡대광전류적영향.
Photoelectrochemical (PEC) solar cells have attracted considerable attention as one of the most effective ways to utilize solar energy.As a cheap and stable semiconductor material,TiO_2 has been frequently used in the PEC solar cells.Doping is one of the most effective ways to enhance the photoelectrochemical properties of TiO_2 thin film electrodes.So far,many efforts have been made to synthesize doped TiO_2 photoelectric films to develop the photoelectrochemical performance.In this study,germanium doped TiO_2 thin films have been synthesized by sol-gel dip-coating method using butyl titanate (Ti(OC_4H_9)_4) and tetra-n-butoxygermane (Ge[O(CH_2)_3CH_3]_4) as the titania and germania precursors,respectively.X-ray powder diffraction (XRD),scanning electron microscope (SEM) attached with energy dispersive X-ray spectroscopy (EDS),optical absorption spectra,and current-potential (I-V) curves have been studied for the prepared Ge-doped TiO2 thin films.The results revealed that Ti1-xGexO2 solid solution formed when x=0.10,while the film exists amorphous when x=0.15.The anatase crystal structure was destroyed gradually with increasing germanium amount.Doping germanium reduced the grain size.The surface morphology of Ge-doped films showed higher particle density than that of pure TiO_2,hence increasing the active site numbers and improving the photoelectrochemical properties.The increase of Ge amount caused a gradual blue shift of optical absorption edge in UV-Vis absorption spectra.The photocurrent was enhanced with proper doping amount,owing to more active sites and comparatively better crystallinity.The maximum value of photocurrent reached 17A/m~2 when germanium amount was 0.05.The mechanism of effects of Ge-doping on the photocurrent of TiO_2 thin film electrodes was also investigated.