硅酸盐学报
硅痠鹽學報
규산염학보
JOURNAL OF THE CHINESE CERAMIC SOCIETY
2006年
8期
937-940,945
,共5页
钱进文%靳正国%邱继军%刘志锋
錢進文%靳正國%邱繼軍%劉誌鋒
전진문%근정국%구계군%류지봉
铜铟硫薄膜%浸渍离子层气相反应%化学计量
銅銦硫薄膜%浸漬離子層氣相反應%化學計量
동인류박막%침지리자층기상반응%화학계량
copper-indium-sulfur thin film%ion layer gas reaction%stoichiometry
以CH3CH2OH为溶剂,CuCl和InCl3为反应物,H2S为硫源,用离子层气相反应法制备了CuInS2半导体薄膜.用X射线衍射、X射线光电子谱、扫描电镜和紫外-可见光谱等对薄膜的晶型、表面化学组成、表面形貌及光电性能进行了表征.分析了混合前驱体溶液中阳离子浓度比[Cu]/[In]对薄膜化学计量及性能的影响.[Cu]/[In]≥1.25时,可获得黄铜矿结构的CuInS2薄膜,其单相形成区外[Cu]/[In]为1.45~1.65.
以CH3CH2OH為溶劑,CuCl和InCl3為反應物,H2S為硫源,用離子層氣相反應法製備瞭CuInS2半導體薄膜.用X射線衍射、X射線光電子譜、掃描電鏡和紫外-可見光譜等對薄膜的晶型、錶麵化學組成、錶麵形貌及光電性能進行瞭錶徵.分析瞭混閤前驅體溶液中暘離子濃度比[Cu]/[In]對薄膜化學計量及性能的影響.[Cu]/[In]≥1.25時,可穫得黃銅礦結構的CuInS2薄膜,其單相形成區外[Cu]/[In]為1.45~1.65.
이CH3CH2OH위용제,CuCl화InCl3위반응물,H2S위류원,용리자층기상반응법제비료CuInS2반도체박막.용X사선연사、X사선광전자보、소묘전경화자외-가견광보등대박막적정형、표면화학조성、표면형모급광전성능진행료표정.분석료혼합전구체용액중양리자농도비[Cu]/[In]대박막화학계량급성능적영향.[Cu]/[In]≥1.25시,가획득황동광결구적CuInS2박막,기단상형성구외[Cu]/[In]위1.45~1.65.
The CuInS2 thin films were prepared by ion layer gas reaction using C2H5OH as a solvent, CuCl and InCl3 as reagents and H2S gas as sulfuration source. The structural, chemical, topographical development and the photoelectric properties of thin films were investigated by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and ultraviolet-visible spectroscopy. The effects of precursor solution on the stoichiometry of CuInS2 films were investigated. The results show that CuInS2 film with the complete chalcopyrite structure is obtained at [Cu]/[In] ≥ 1.25, and near stoichimetric CuInS2 without any segregation phases is obtained in the range of 1.45-1.65.