功能材料
功能材料
공능재료
JOURNAL OF FUNCTIONAL MATERIALS
2010年
1期
14-16
,共3页
祁先进%李国华%王寅岗%李子全
祁先進%李國華%王寅崗%李子全
기선진%리국화%왕인강%리자전
退火%织构%界面粗糙度%交换偏置场
退火%織構%界麵粗糙度%交換偏置場
퇴화%직구%계면조조도%교환편치장
annealing%texture%interface roughness%exchange bias field
采用高真空直流磁控溅射的方法制备了结构为//Ta(5nm)/Co_(75)Fe_(25)(5nm)/Ir_(20)Mn_(80)(12nm)/Ta(8nm)的双层膜,通过X射线衍射(XRD)、原子力显微镜(AFM) 和振动样品磁强计(VSM)研究了退火对双层膜的结构及磁性能的影响;并通过样品在反向饱和场下停留不同的时间,研究了退火对双层膜的磁稳定性的影响.结果表明,退火使得IrMn(111)织构减弱,表面/界面粗糙度增大,交换偏置场减小,矫顽力增加,退火降低了双层膜的磁稳定性.
採用高真空直流磁控濺射的方法製備瞭結構為//Ta(5nm)/Co_(75)Fe_(25)(5nm)/Ir_(20)Mn_(80)(12nm)/Ta(8nm)的雙層膜,通過X射線衍射(XRD)、原子力顯微鏡(AFM) 和振動樣品磁彊計(VSM)研究瞭退火對雙層膜的結構及磁性能的影響;併通過樣品在反嚮飽和場下停留不同的時間,研究瞭退火對雙層膜的磁穩定性的影響.結果錶明,退火使得IrMn(111)織構減弱,錶麵/界麵粗糙度增大,交換偏置場減小,矯頑力增加,退火降低瞭雙層膜的磁穩定性.
채용고진공직류자공천사적방법제비료결구위//Ta(5nm)/Co_(75)Fe_(25)(5nm)/Ir_(20)Mn_(80)(12nm)/Ta(8nm)적쌍층막,통과X사선연사(XRD)、원자력현미경(AFM) 화진동양품자강계(VSM)연구료퇴화대쌍층막적결구급자성능적영향;병통과양품재반향포화장하정류불동적시간,연구료퇴화대쌍층막적자은정성적영향.결과표명,퇴화사득IrMn(111)직구감약,표면/계면조조도증대,교환편치장감소,교완력증가,퇴화강저료쌍층막적자은정성.
The CoFe/IrMn bilayer was deposited by high vacuum magnetron sputtering on a silicon wafer substrate.The influences of annealing on texture and magnetic properties were investigated by X-ray diffraction (XRD),atomic force microscopy (AFM) and vibrating sample magnetometry (VSM).And the magnetic stability of both as-prepared and annealed CoFe/IrMn bilayers has been investigated by means of holding the film in a negative saturation field.The results show that the texture of IrMn(111)weakens and the surface/interface roughness increases after annealing,meanwhile,the exchange bias decreases and coercivity increases.Furthermore,the magnetic stability decreases after annealing.