兵器材料科学与工程
兵器材料科學與工程
병기재료과학여공정
Ordnance Material Science and Engineering
2010年
2期
35-37
,共3页
刘智勇%杨润田%刘若涛%杨亚璋
劉智勇%楊潤田%劉若濤%楊亞璋
류지용%양윤전%류약도%양아장
电弧源%中频磁控溅射TiAlBN涂层%TiN涂层%共沉积
電弧源%中頻磁控濺射TiAlBN塗層%TiN塗層%共沉積
전호원%중빈자공천사TiAlBN도층%TiN도층%공침적
arc ion plating%intermediate frequency unbalanced magnetron sputtering%TiAlBN films%TiN films%together deposition
采用AlBi2+2%AlB10电弧靶与Ti靶中频磁控溅射共沉积的工艺,在高速钢基体上形成Ti-Al-B-N多元复合涂层.电子扫描电镜(SEM)、X射线衍射(XRD)分析结果表明:涂层由TiN的柱状结构转变为TiAlBN的多层混合结构,组织更为致密均匀;通过调节电弧电流,增加Al、B元素剂量,涂层晶面取向生长增多,并逐渐出现新相.涂层的显微硬度和耐磨性测试表明,随膜层中Al、B成分的增加,膜层维氏硬度增大,耐磨性能提高.
採用AlBi2+2%AlB10電弧靶與Ti靶中頻磁控濺射共沉積的工藝,在高速鋼基體上形成Ti-Al-B-N多元複閤塗層.電子掃描電鏡(SEM)、X射線衍射(XRD)分析結果錶明:塗層由TiN的柱狀結構轉變為TiAlBN的多層混閤結構,組織更為緻密均勻;通過調節電弧電流,增加Al、B元素劑量,塗層晶麵取嚮生長增多,併逐漸齣現新相.塗層的顯微硬度和耐磨性測試錶明,隨膜層中Al、B成分的增加,膜層維氏硬度增大,耐磨性能提高.
채용AlBi2+2%AlB10전호파여Ti파중빈자공천사공침적적공예,재고속강기체상형성Ti-Al-B-N다원복합도층.전자소묘전경(SEM)、X사선연사(XRD)분석결과표명:도층유TiN적주상결구전변위TiAlBN적다층혼합결구,조직경위치밀균균;통과조절전호전류,증가Al、B원소제량,도층정면취향생장증다,병축점출현신상.도층적현미경도화내마성측시표명,수막층중Al、B성분적증가,막층유씨경도증대,내마성능제고.
Ti-Al-B-N compound coatings were deposited on polished surface of high speed steel by arc ion plating together with intermediate frequency unbalanced magnetron sputtering.The analysis results of SEM and XRD indicate that the size of droplets on the surface of TiAlBN is smaller than that on the TiN films,the defects are eliminated on a large scale,and the microstructurc of the sulfate is more compact and uniform.The lattice distortion of TiN films is caused by the addition of AI,B element,and the new phase appeares.Its surface hardness and wear resistance are also improved obviously.