微电子学
微電子學
미전자학
MICROELECTRONICS
2010年
1期
132-135
,共4页
唐昭焕%徐岚%刘勇%税国华
唐昭煥%徐嵐%劉勇%稅國華
당소환%서람%류용%세국화
膜厚测试仪%数理统计%SPC%半导体工艺
膜厚測試儀%數理統計%SPC%半導體工藝
막후측시의%수리통계%SPC%반도체공예
Film thickness measurement system%Mathematical statistics%SPC%Semiconductor process
通过采用PPM、SPC软件和数理统计方法对样本进行处理的方式,对一种Nanometrics膜厚测试仪精密度的评价方法进行研究.讨论了样本在数据收集、分析、处理过程中的难点,得到Nanometrics膜厚测试仪精密度为1.25%的结论;找到了一种适合该膜厚测试仪精密度的评价方法.
通過採用PPM、SPC軟件和數理統計方法對樣本進行處理的方式,對一種Nanometrics膜厚測試儀精密度的評價方法進行研究.討論瞭樣本在數據收集、分析、處理過程中的難點,得到Nanometrics膜厚測試儀精密度為1.25%的結論;找到瞭一種適閤該膜厚測試儀精密度的評價方法.
통과채용PPM、SPC연건화수리통계방법대양본진행처리적방식,대일충Nanometrics막후측시의정밀도적평개방법진행연구.토론료양본재수거수집、분석、처리과정중적난점,득도Nanometrics막후측시의정밀도위1.25%적결론;조도료일충괄합해막후측시의정밀도적평개방법.
Precision evaluation method for Nanometrics measurement system was studied by using PPM, SPC and mathematical statistics method to analyze and process samples. Difficulties in data collecting, analyzing and processing were discussed, and the accuracy of the Nanometrics measurement system was calculated to be 1.25%. A precision evaluation method suitable for film thickness measurement system was presented.