半导体技术
半導體技術
반도체기술
SEMICONDUCTOR TECHNOLOGY
2010年
1期
46-49,93
,共5页
陈超%吴龙胜%韩本光%方勇%刘佑宝
陳超%吳龍勝%韓本光%方勇%劉祐寶
진초%오룡성%한본광%방용%류우보
电荷共享%超深亚微米%器件模拟%单粒子辐射%寄生双极管效应
電荷共享%超深亞微米%器件模擬%單粒子輻射%寄生雙極管效應
전하공향%초심아미미%기건모의%단입자복사%기생쌍겁관효응
charge sharing%VDSM%device simulation%SEE%parasitic bipolar effect
研究了同一P阱内两个130 nm NMOS器件在受到重离子辐射后产生的电荷共享效应.使用TCAD仿真构造并校准了130 nm NMOS管.研究了在有无p~+保护环结构及不同器件间距下,处于截止态的NMOS晶体管之间的电荷共享,给出了电荷共享效应与SET脉冲电流产生的机理.同时分析了NMOS晶体管中的寄生双极管效应对反偏漏体结电荷收集的加剧作用.仿真结果表明,p~+保护环可以有效地减小NMOS器件间的电荷共享,加速SET脉冲电流的泄放,证实了p~+保护环对器件抗单粒子辐射的有效性,从而给出了该方法在抗单粒子辐射器件版图设计中的可行性.
研究瞭同一P阱內兩箇130 nm NMOS器件在受到重離子輻射後產生的電荷共享效應.使用TCAD倣真構造併校準瞭130 nm NMOS管.研究瞭在有無p~+保護環結構及不同器件間距下,處于截止態的NMOS晶體管之間的電荷共享,給齣瞭電荷共享效應與SET脈遲電流產生的機理.同時分析瞭NMOS晶體管中的寄生雙極管效應對反偏漏體結電荷收集的加劇作用.倣真結果錶明,p~+保護環可以有效地減小NMOS器件間的電荷共享,加速SET脈遲電流的洩放,證實瞭p~+保護環對器件抗單粒子輻射的有效性,從而給齣瞭該方法在抗單粒子輻射器件版圖設計中的可行性.
연구료동일P정내량개130 nm NMOS기건재수도중리자복사후산생적전하공향효응.사용TCAD방진구조병교준료130 nm NMOS관.연구료재유무p~+보호배결구급불동기건간거하,처우절지태적NMOS정체관지간적전하공향,급출료전하공향효응여SET맥충전유산생적궤리.동시분석료NMOS정체관중적기생쌍겁관효응대반편루체결전하수집적가극작용.방진결과표명,p~+보호배가이유효지감소NMOS기건간적전하공향,가속SET맥충전류적설방,증실료p~+보호배대기건항단입자복사적유효성,종이급출료해방법재항단입자복사기건판도설계중적가행성.
The charge sharing effect between 130 nm NMOS devices in the same p-well occurring after heavy ion irradiation was investigated. TCAD simulation was used to generate and calibrate the 130 nm NMOSFET. The charge sharing effects between two 130 nm off-NMOSFETs with and without p~+ guard-ring,and with different device distance were explored. The charge sharing effect and SET current generating mechanisms wre represented. The exacerbating effect of parasitic bipolar effect in the charge collection in the reverse-biased drain-body junction of an off-NMOSFET was also represented. The simulation results demonstrate that the p~+ guard-ring can effectively reduce the charge sharing effect between NMOSFETs and accelerate the discharge of the SET current. The effectiveness of p~+ guard-ring using in the migrating of single event effect and the feasibility of its use in radiation hardening by layout design are validated.