Infrared and Optical Properties of Amorphous Fluorinated Hydrocarbon Films Deposited with the Method of ECR Plasma
  • 万方数据
    等离子体科学和技术(英文版) 등리자체과학화기술(영문판)
    PLASMA SCIENCE & TECHNOLOGY
    2004年 3期 2337-2341 ,共5页

    辛煜%许圣华%宁兆元%陈军%陆新华%项苏留%黄松%杜伟%程珊华

    신욱%허골화%저조원%진군%륙신화%항소류%황송%두위%정산화



    a-C:F:H films%FTIR%UV-VIS%optical band gap


    Using CH4 and CF4 precursor gases, amorphous fluorinated hydrocarbon (a-C:F:H)films were prepared with the method of microwave electronic cyclotron resonant (ECR) plasma chemical vapor deposition. Deposition rate of the film firstly increases and then decreases with variable flow ratios R {[CF4]/([CF4]+[CH4]} due to the competition between deposition and etch ing process. Results from Fourier-transform infrared transmission spectroscopy of these films show that C-F bond configuration in a-C:F:H films evolves with the variable gas flow ratios R. The locations of the C-F peaks in IR spectra shift to higher frequency with the increase of R, and finally the structure in films with R ＞75% takes on a PTFE-like structure, which mainly consists of -CF2- chain. The change of optical band gap Eg deduced by a Tauc plot with R is also discussed.
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