真空
真空
진공
VACUUM
2001年
1期
12-14
,共3页
王志海%孙墨汉%王希囡%张钧
王誌海%孫墨漢%王希囡%張鈞
왕지해%손묵한%왕희닙%장균
多弧离子镀%合金涂层%成分
多弧離子鍍%閤金塗層%成分
다호리자도%합금도층%성분
采用多弧离子镀制备的合金涂层成分与合金阴极靶之间通常存在一定程度的偏差。这种离析效应导致了合金涂层成分控制及合金靶材成分设计的困难。现在的研究工作提出了一个简易的公式an=[(an0*fn)/i(ai0*fi)]*100%用于解决这些问题。此公式可以根据合金元素的离化率计算涂层的合金成分。计算结果与实验结果取得了较好的一致。改变该公式的表达方式an0=[(an/fn)/i(ai/fi)]*100%,则易于完成阴极靶源的成分设计,并且实现合金涂层的理想成分。
採用多弧離子鍍製備的閤金塗層成分與閤金陰極靶之間通常存在一定程度的偏差。這種離析效應導緻瞭閤金塗層成分控製及閤金靶材成分設計的睏難。現在的研究工作提齣瞭一箇簡易的公式an=[(an0*fn)/i(ai0*fi)]*100%用于解決這些問題。此公式可以根據閤金元素的離化率計算塗層的閤金成分。計算結果與實驗結果取得瞭較好的一緻。改變該公式的錶達方式an0=[(an/fn)/i(ai/fi)]*100%,則易于完成陰極靶源的成分設計,併且實現閤金塗層的理想成分。
채용다호리자도제비적합금도층성분여합금음겁파지간통상존재일정정도적편차。저충리석효응도치료합금도층성분공제급합금파재성분설계적곤난。현재적연구공작제출료일개간역적공식an=[(an0*fn)/i(ai0*fi)]*100%용우해결저사문제。차공식가이근거합금원소적리화솔계산도층적합금성분。계산결과여실험결과취득료교호적일치。개변해공식적표체방식an0=[(an/fn)/i(ai/fi)]*100%,칙역우완성음겁파원적성분설계,병차실현합금도층적이상성분。
The composition generally changes from alloy cathode target to alloy coating deposited by multi-arc ion plating to some extent. This demixing effect leads to the difficulties in the control of alloy composition of coating and in the design of composition of alloy cathode target. A simple formula, an=[(an0*fn)/i(ai0*fi)]*100%,is proposed to deal with the problems. According to this formula, the composition of alloy coating can be calculated by means of the degrees of ionization of alloy elements. The results of calculation agree with the experimental ones. Modifying the formula into another form, an0=[(an/fn)/i(ai/fi)]*100%,the design for alloy composition of cathode target can easily carried out.