强激光与粒子束
彊激光與粒子束
강격광여입자속
HIGH POWER LASER AND PARTICLEBEAMS
2010年
1期
181-184
,共4页
祁康成%王小菊%林祖伦%陈文彬%曹贵川
祁康成%王小菊%林祖倫%陳文彬%曹貴川
기강성%왕소국%림조륜%진문빈%조귀천
六硼化镧%逸出功%电子束蒸发%热发射%场发射
六硼化鑭%逸齣功%電子束蒸髮%熱髮射%場髮射
륙붕화란%일출공%전자속증발%열발사%장발사
Lanthanum hexaboride%work function%e-beam deposition%thermal emission%field emission
六硼化镧(LaB_6)具有电子逸出功低、高熔点和高化学稳定性等优点,是制作热阴极和场发射阴极的理想发射体材料.而且在常规场发射尖锥表面涂敷一层LaB_6薄膜能够大幅度提高场发射尖锥的发射能力.为了测量LaB_6 薄膜的逸出功,采用电子束蒸发技术沉积LaB_6薄膜,并对薄膜进行了X射线衍射分析和X射线光电谱分析.通过测量薄膜的热电子发射特性和敷LaB_6薄膜的硅尖锥阵列的场致电子发射特性确定了LaB_6薄膜的逸出功,与块状LaB_6多晶材料的逸出功大体相同,说明电子束蒸发沉积技术适合于制备高纯度、低逸出功的LaB_6薄膜.
六硼化鑭(LaB_6)具有電子逸齣功低、高鎔點和高化學穩定性等優點,是製作熱陰極和場髮射陰極的理想髮射體材料.而且在常規場髮射尖錐錶麵塗敷一層LaB_6薄膜能夠大幅度提高場髮射尖錐的髮射能力.為瞭測量LaB_6 薄膜的逸齣功,採用電子束蒸髮技術沉積LaB_6薄膜,併對薄膜進行瞭X射線衍射分析和X射線光電譜分析.通過測量薄膜的熱電子髮射特性和敷LaB_6薄膜的硅尖錐陣列的場緻電子髮射特性確定瞭LaB_6薄膜的逸齣功,與塊狀LaB_6多晶材料的逸齣功大體相同,說明電子束蒸髮沉積技術適閤于製備高純度、低逸齣功的LaB_6薄膜.
륙붕화란(LaB_6)구유전자일출공저、고용점화고화학은정성등우점,시제작열음겁화장발사음겁적이상발사체재료.이차재상규장발사첨추표면도부일층LaB_6박막능구대폭도제고장발사첨추적발사능력.위료측량LaB_6 박막적일출공,채용전자속증발기술침적LaB_6박막,병대박막진행료X사선연사분석화X사선광전보분석.통과측량박막적열전자발사특성화부LaB_6박막적규첨추진렬적장치전자발사특성학정료LaB_6박막적일출공,여괴상LaB_6다정재료적일출공대체상동,설명전자속증발침적기술괄합우제비고순도、저일출공적LaB_6박막.
Lanthanum hexaboride (LaB_6) is a low work function material. When coated on conventional field emission tips, it can significantly enlarge the field emission current of the tips. To determine its work function, LaB_6 films were deposited through e-beam deposition. It is found that the films with low oxygen content were (100) preferentially oriented. The work function was measured by thermal emission and field emission independently, yielding a value of 2.67 eV and 2.91 eV, respectively, suggesting that e-beam deposited LaB_6 films preserve the low work function of bulk LaB_6.