CAJ | 학술논문

采用微波等离子体方法在铜片上沉积了多晶金刚石薄膜，用该薄膜制成的场致发射体的开启电压较低，发射电流密度较高。利用自制的场致发射阵列阴极高真空测试台测试了1～100 mA／cm2的发射电流密度特性，对应的电场强度为2.0～3.5 MV／m。从拟合F-N公式得到的功函数Φ≈0.025 eV，所发射电子轰击荧光屏后能产生明亮的光斑。
채용미파등리자체방법재동편상침적료다정금강석박막，용해박막제성적장치발사체적개계전압교저，발사전류밀도교고。이용자제적장치발사진렬음겁고진공측시태측시료1～100 mA／cm2적발사전류밀도특성，대응적전장강도위2.0～3.5 MV／m。종의합F-N공식득도적공함수Φ≈0.025 eV，소발사전자굉격형광병후능산생명량적광반。
Polycrystalline diamond films were grown on copper substrates by microwave plasma chemical vapor deposition(MPCVD).The field emission characteristics of the film was studied.We found that the field emitter made of the film has a low turn-on voltage.The current density of the film can be 1～100 mA／cm2 at the field strengths of 2.0～3.5 MV／m.The work function of the film was found to be 0.025 eV by data fitting of the Fowler-Nordheim plot.When emission electrons bombarded a fluorescent screen,fairly bright spots could be observed.