CAJ | 학술논문

根据感应耦合等离子(Inductively coupled plasma, ICP)刻蚀的机理,针对热氧化硅薄膜微拉伸梁的结构特点,研究ICP刻蚀制作3D微拉伸梁结构的工艺并解决其中的难点问题.介绍ICP刻蚀工艺参数对刻蚀质量的影响,包括存在的微负载效应和深宽比效应.详细介绍热氧化硅薄膜微拉伸梁的制作,其关键步骤是双掩膜两次ICP刻蚀形成阶梯状窗口结构,并在硅衬底表面形成释放了的热氧化硅薄膜梁.利用ICP刻蚀对单晶硅的高选择性,此制作工艺适用于各种薄膜的微拉伸梁制作.
근거감응우합등리자(Inductively coupled plasma, ICP)각식적궤리,침대열양화규박막미랍신량적결구특점,연구ICP각식제작3D미랍신량결구적공예병해결기중적난점문제.개소ICP각식공예삼수대각식질량적영향,포괄존재적미부재효응화심관비효응.상세개소열양화규박막미랍신량적제작,기관건보취시쌍엄막량차ICP각식형성계제상창구결구,병재규츤저표면형성석방료적열양화규박막량.이용ICP각식대단정규적고선택성,차제작공예괄용우각충박막적미랍신량제작.
Based on the mechanism of inductively coupled plasma (ICP) etching, the micromachining processing of 3D micro tensile beams is researched in the light of the structure characteristics of the thermal silicon dioxide micro-tensile beams and with the purpose of solving the main problems in the processing. The influences of ICP etching process parameters on etching quality, including micro loading effect and aspect ratio effect in existence, are presented. The micromachining processing of the beams is introduced in detail. The pivotal procedure is double-masks-twice-ICP etching to form stair-opening structures and to obtain the free-standing thermal silicon dioxide beams on the surface of silicon. Using the high selectivity of single crystal silicon in ICP etching, the processing method is applicable in the fabrication of micro tensile beams with various films.